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1. (WO2017069738) PATTERNED LAYER DEPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2017/069738    International Application No.:    PCT/US2015/056406
Publication Date: 27.04.2017 International Filing Date: 20.10.2015
IPC:
B29C 67/00 (2017.01), B33Y 30/00 (2015.01), B33Y 50/02 (2015.01)
Applicants: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. [US/US]; 11445 Compaq Center Drive W Houston, Texas 77070 (US)
Inventors: OCHS, David H; (US).
YU, Joshua M; (US).
NIELSEN, Jeffrey A; (US).
WARD, Kenneth; (US).
DUDENHOEFER, Christie; (US)
Agent: WU, Bruce; (US)
Priority Data:
Title (EN) PATTERNED LAYER DEPOSITION
(FR) DÉPÔT DE COUCHE À MOTIFS
Abstract: front page image
(EN)Systems, methods, and computer readable medium to provide patterned layer deposition of liquid types to a plate surface in layers organized in layouts with sites of patterns aligned to a plate origin of the plate surface. At least one layer includes a layout defining a geometric layout of the plate surface.
(FR)L'invention concerne des systèmes, des procédés et un support lisible par ordinateur permettant de fournir un dépôt de couche à motifs de types de liquide à la surface d'une plaque en couches organisées selon des dispositions comportant des sites de motifs alignés à une origine de plaque de la surface de la plaque. Au moins une couche comprend une disposition délimitant une disposition géométrique de la surface de la plaque.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)