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1. (WO2017069560) SILICON TEXTURING COMPOSITION AND PREPARATION METHOD THEREFOR
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2017/069560    International Application No.:    PCT/KR2016/011899
Publication Date: 27.04.2017 International Filing Date: 21.10.2016
IPC:
H01L 31/0236 (2006.01), C07H 3/04 (2006.01), C08B 11/12 (2006.01), C08B 37/00 (2006.01), C01D 1/04 (2006.01), C01C 1/00 (2006.01), H01L 31/18 (2006.01)
Applicants: OCI COMPANY LTD. [KR/KR]; 94 Sogong-ro Jung-gu Seoul 04532 (KR)
Inventors: SONG, Mun-Ho; (KR).
BAEK, Jin-Joo; (KR)
Agent: DAE-A INTELLECTUAL PROPERTY CONSULTING; 3F, Hanyang Bldg., 123 Yeoksam-ro Gangnam-gu Seoul 06243 (KR)
Priority Data:
10-2015-0148132 23.10.2015 KR
Title (EN) SILICON TEXTURING COMPOSITION AND PREPARATION METHOD THEREFOR
(FR) COMPOSITION DE TEXTURATION DE SILICIUM ET SON PROCÉDÉ DE PRÉPARATION
(KO) 실리콘 텍스쳐링 조성물 및 이의 제조방법
Abstract: front page image
(EN)The present invention relates to a silicon texturing composition and a preparation method therefor and, more specifically, to a texturing composition comprising an alkali compound, a polysaccharide and a disaccharide, wherein, the content ratio of a carboxymethyl cellulose metal salt and a metal alginate in the polysaccharide is adjusted such that a more uniform surface shape is implemented when wet etching a silicon wafer.
(FR)La présente invention porte sur une composition de texturation de silicium et son procédé de préparation et, plus précisément, une composition de texturation comprenant un composé alcalin, un polysaccharide et un disaccharide, le ratio de teneur d'un sel de métal de carboxyméthylcellulose et d'un alginate de métal dans le polysaccharide étant ajusté de telle sorte qu'une forme de surface plus uniforme soit garantie lors de la gravure par voie humide d'une plaquette de silicium.
(KO)본 발명은 실리콘 텍스쳐링 조성물 및 이의 제조방법에 관한 것이며, 보다 상세하게는 알칼리 화합물, 다당류 및 이당류를 포함하되, 상기 다당류에 있어서 카복시메틸셀룰로오스 금속염 및 알긴산 금속염의 함량비를 조절하여 실리콘 웨이퍼 습식 식각시 보다 균일한 표면 형상을 구현하는 텍스쳐링 조성물에 관한 것이다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)