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1. (WO2017069202) POLISHING COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2017/069202    International Application No.:    PCT/JP2016/081115
Publication Date: 27.04.2017 International Filing Date: 20.10.2016
IPC:
C09K 3/14 (2006.01), B24B 37/00 (2012.01), H01L 21/304 (2006.01)
Applicants: NITTA HAAS INCORPORATED [JP/JP]; 4-26, Sakuragawa 4-chome, Naniwa-ku, Osaka-shi, Osaka 5560022 (JP)
Inventors: SUGITA, Noriaki; (JP).
CHINEN, Mika; (JP).
MATSUSHITA, Takayuki; (JP).
MATSUDA, Shuhei; (JP)
Agent: UEBA Hidetoshi; (JP).
KOMIYAMA Satoshi; (JP).
SAKANE Tsuyoshi; (JP)
Priority Data:
2015-209327 23.10.2015 JP
Title (EN) POLISHING COMPOSITION
(FR) COMPOSITION DE POLISSAGE
(JA) 研磨用組成物
Abstract: front page image
(EN)Provided is a polishing composition that can suppress surface defects and reduce haze. A polishing composition that includes: abrasive grains; at least one type of water-soluble polymer selected from among vinyl-alcohol-based resins that have a 1,2-diol structural unit; and an alkali compound. The average particle size, as measured by dynamic light scattering, of the particles of the polishing composition is 55 nm or less. The polishing composition ideally also includes a non-ionic surfactant. The polishing composition ideally also includes a polyhydric alcohol.
(FR)L'invention concerne une composition de polissage qui peut éliminer les irrégularités superficielles et réduire le voile. La composition de polissage selon l'invention comprend : des grains abrasifs; au moins un type de polymère soluble dans l'eau choisi parmi les résines à base d'alcool vinylique contenant un motif structural de type 1,2-diol ; et un composé alcalin. La taille de particule moyenne, mesurée par diffusion dynamique de la lumière, des particules de la composition de polissage est de 55 nm ou moins. Dans l'idéal, la composition de polissage comprend également un tensioactif non ionique. Dans l'idéal, la composition de polissage comprend également un alcool polyhydrique.
(JA)表面欠陥の抑制及びヘイズの低減を実現可能な研磨用組成物を提供する。研磨用組成物は、砥粒と、1,2-ジオール構造単位を有するビニルアルコール系樹脂から選ばれた少なくとも一種類の水溶性高分子と、アルカリ化合物と、を含み、動的光散乱法を用いて測定された研磨組成物中の粒子の平均粒子径が55nm以下である。研磨用組成物は、さらに、非イオン性界面活性剤を含むことが好ましい。また、研磨用組成物は、さらに、多価アルコールを含むことが好ましい。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)