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1. (WO2017067757) METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

Pub. No.:    WO/2017/067757    International Application No.:    PCT/EP2016/072960
Publication Date: Fri Apr 28 01:59:59 CEST 2017 International Filing Date: Wed Sep 28 01:59:59 CEST 2016
IPC: G03F 1/72
G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: TEN BERGE, Peter
SLOTBOOM, Daan, Maurits
VAN HAREN, Richard, Johannes, Franciscus
WARDENIER, Peter, Hanzen
Title: METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
Abstract:
A method including: determining first error information (1310) based on a first measurement and/or simulation result (1300) pertaining to a first patterning device in a patterning system; determining second error information (1330) based on a second measurement and/or simulation result (1320) pertaining to a second patterning device in the patterning system; determining (1340) a difference between the first error information and the second error information; and creating, by a computer system, modification information (1360) for the first patterning device and/or the second patterning device based on the difference between the first error information and the second error information, wherein the difference between the first error information and the second error information is reduced to within a certain range after the first patterning device and/or the second patterning device is modified according to the modification information.