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1. (WO2017067756) METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

Pub. No.:    WO/2017/067756    International Application No.:    PCT/EP2016/072936
Publication Date: Fri Apr 28 01:59:59 CEST 2017 International Filing Date: Wed Sep 28 01:59:59 CEST 2016
IPC: G03F 7/20
G03F 1/72
G03F 1/70
Applicants: ASML NETHERLANDS B.V.
Inventors: MULKENS, Johannes, Catharinus, Hubertus
Title: METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
Abstract:
A method including: obtaining information describing a modification made or to be made by a pattern modification tool to a patterning device for a patterning process (1100); obtaining a spatial distribution of temperature and/or deformation of the patterning device (1110); and predicting (1120), by a computer system, cracking behavior of the patterning device based on the modification information of the patterning device and the spatial distribution of temperature and/or deformation of the patterning device.