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1. (WO2017066873) PROCESS MONITORING DEVICE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2017/066873 International Application No.: PCT/CA2016/051211
Publication Date: 27.04.2017 International Filing Date: 19.10.2016
IPC:
H01L 21/66 (2006.01) ,G01D 21/00 (2006.01) ,G01K 1/14 (2006.01) ,H01L 35/00 (2006.01) ,H02J 50/10 (2016.01) ,H02J 7/02 (2016.01)
Applicants: NOVENA TEC INC.[CA/CA]; 3980 14th Avenue Unit 7 Markham, Ontario L3R 0B1, CA
Inventors: ROMMEL, Montes; CA
THIRUN, Ravi; CA
THIRU, Rajan; CA
Agent: MBM INTELLECTUAL PROPERTY LAW LLP; 275 Slater Street, 14th Floor Ottawa, Ontario K1P 5H9, CA
Priority Data:
62/243,36319.10.2015US
Title (EN) PROCESS MONITORING DEVICE
(FR) DISPOSITIF DE SURVEILLANCE DE TRAITEMENT
Abstract: front page image
(EN) A process chamber measurement wafer for location inside a process chamber and measuring environmental conditions within the process chamber during a process run. The process chamber measurement wafer including a releasable dummy wafer to protect the instrumented portion of the process chamber measurement wafer from process material deposited during the process run.
(FR) La présente invention concerne une plaquette de mesure de chambre de traitement conçue pour être placée à l'intérieur d'une chambre de traitement et pour mesurer des conditions environnementales à l'intérieur de la chambre de traitement pendant la réalisation d'un traitement. La plaquette de mesure de chambre de traitement comprend une plaquette factice amovible pour protéger la partie instrumentée de la plaquette de mesure de chambre de traitement d'un matériau de traitement déposé pendant la réalisation du traitement.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)