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1. (WO2017065153) PHOTORESIST STRIPPING SOLUTION

Pub. No.:    WO/2017/065153    International Application No.:    PCT/JP2016/080191
Publication Date: Fri Apr 21 01:59:59 CEST 2017 International Filing Date: Thu Oct 13 01:59:59 CEST 2016
IPC: G03F 7/42
H01L 21/027
H01L 21/304
Applicants: NAGASE CHEMTEX CORPORATION
ナガセケムテックス株式会社
Inventors: NISHIJIMA, Yoshitaka
西嶋 佳孝
Title: PHOTORESIST STRIPPING SOLUTION
Abstract:
The purpose of the present invention is to provide a photoresist stripping solution that has an excellent ability to maintain the solubility of a quaternary ammonium hydroxide and excellent temporal stability while maintaining a sufficient ability to strip resists. The present invention pertains to a photoresist stripping solution characterized by including dimethyl sulfoxide, a quaternary ammonium hydroxide, an alkylene amine, and a polyhydric alcohol and/or a glycol ether having a molecular weight of 100 or less. The alkylene amine is preferably an ethylene amine represented by general formula (1) (in general formula (1), n is an integer from 1 to 5).