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1. (WO2017064048) REACTOR FOR DEPOSITING POLYCRYSTALLINE SILICON

Pub. No.:    WO/2017/064048    International Application No.:    PCT/EP2016/074317
Publication Date: Fri Apr 21 01:59:59 CEST 2017 International Filing Date: Wed Oct 12 01:59:59 CEST 2016
IPC: C01B 33/035
Applicants: WACKER CHEMIE AG
Inventors: KRAUS, Heinz
KUTZA, Christian
Title: REACTOR FOR DEPOSITING POLYCRYSTALLINE SILICON
Abstract:
The invention relates to a reactor for depositing polycrystalline silicon, said reactor being delimited laterally and at the top by a reactor wall and at the bottom by a base plate and comprising multiple filament rods which are attached to the base plate and which can be heated by a direct passage of current, a feed gas system which is led through one or more openings of the base plate for introducing a reaction gas mixture containing silicon into the reactor, and an exhaust gas system which is led through one or more openings of the base plate for discharging exhaust gas from the reactor. The invention is characterized in that the feed gas system and/or the exhaust gas system comprises at least one protective element which consists of metal, ceramic, or CFC and which has openings or mesh. The openings and the mesh of the protective element are configured such that only silicon components which can be removed by being flushed out of the feed gas or exhaust gas system can reach the feed gas or exhaust gas system below the protective element.