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1. (WO2017061742) SUBSTRATE PROCESSING APPARATUS HAVING EXHAUST GAS DECOMPOSER, AND EXHAUST GAS PROCESSING METHOD THEREFOR
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2017/061742    International Application No.:    PCT/KR2016/011045
Publication Date: 13.04.2017 International Filing Date: 04.10.2016
IPC:
H01L 21/02 (2006.01), H01L 21/67 (2006.01), H01L 21/60 (2006.01)
Applicants: JUSUNG ENGINEERING CO., LTD. [KR/KR]; 240, Opo-ro, Opo-eup, Gwangju-si Gyeonggi-do 12773 (KR)
Inventors: SEO, Dong Won; (KR).
KIM, Heon Do; (KR).
HWANG, Chul-Joo; (KR)
Agent: ASTRAN INT'L IP GROUP; (ShinSung Building, Yeoksam-dong) 5th Floor, 233, Yeoksam-ro, Gangnam-gu, Seoul 06225 (KR)
Priority Data:
10-2015-0139794 05.10.2015 KR
Title (EN) SUBSTRATE PROCESSING APPARATUS HAVING EXHAUST GAS DECOMPOSER, AND EXHAUST GAS PROCESSING METHOD THEREFOR
(FR) APPAREIL DE TRAITEMENT DE SUBSTRATS AVEC DÉCOMPOSEUR DE GAZ D'ÉCHAPPEMENT, ET SON PROCÉDÉ DE TRAITEMENT DE GAZ D'ÉCHAPPEMENT
(KO) 배기가스 분해기를 가지는 기판처리장치 및 그 배기가스 처리방법
Abstract: front page image
(EN)A substrate processing apparatus and an exhaust gas processing method therefor are disclosed. The substrate processing apparatus and the exhaust gas processing method therefor, according to the present invention, allow a source gas exhausted from a processing chamber to be decomposed in an exhaust gas decomposer to decompose a ligand of the source gas. Further, the ligand and the source gas with the decomposed ligand are stabilized by reaction with separately supplied O2, N2O or O3, and are then introduced into and discharged from an exhaust pump in the form of a mixture gas mixed with a reaction gas, or are discharged from the exhaust pump while being mixed with the reaction gas whereby the ligand and the source gas with the decomposed ligand do not react with heat generated from the exhaust pump and also do not react with the reaction gas. Thus, it is possible to prevent the ligand and the source gas with the decomposed ligand introduced into the exhaust pump from being deposited on the inner surface of the exhaust pump. It is also possible to prevent explosion of the ligand and the source gas with the decomposed ligand accumulated inside the exhaust pump.
(FR)L'invention concerne un appareil de traitement de substrats et un son procédé de traitement de gaz d'échappement. L'appareil de traitement de substrats et son procédé de traitement de gaz d'échappement, selon la présente invention, permettent à un gaz source évacué d'une chambre de traitement d'être décomposé dans un décomposeur de gaz d'échappement pour décomposer un ligand du gaz source. En outre, le ligand et le gaz source dont le ligand a été décomposé sont stabilisés par réaction avec O2, N2O ou O3 fournis séparément, puis sont introduits dans et refoulés à partir d'une pompe d'évacuation sous la forme d'un mélange gazeux mélangé à un gaz de réaction, ou sont refoulés de la pompe d'évacuation tout en étant mélangés au gaz de réaction, le ligand et le gaz source dont le ligand a été décomposé ne réagissant pas avec la chaleur générée à partir de la pompe d'évacuation et ne réagissant pas non plus avec le gaz de réaction. Ainsi, il est possible d'empêcher le ligand et le gaz source dont le ligand a été décomposé introduits dans la pompe d'évacuation d'être déposés sur la surface intérieure de la pompe d'évacuation. Il est également possible d'empêcher explosion du ligand et du gaz source dont le ligand a été décomposé accumulés à l'intérieur de la pompe d'évacuation.
(KO)기판처리장치 및 그 배기가스 처리방법이 개시된다. 본 발명에 따른 기판처리장치 및 그 배기가스 처리방법은, 공정챔버에서 배기되는 소스가스를 배기가스 분해기에서 분해하여 소스가스의 리간드를 분해한다. 그리고, 리간드 및 리간드가 분해된 소스가스는 별도로 공급되는 O2, N2O 또는 O3와 반응하여 안정화된 상태가 된 후, 반응가스와 혼합된 혼합가스 형태가 되어 배기펌프로 유입되어 배출되거나, 배기펌프에서 반응가스와 혼합되어 배출된다. 이로 인해, 리간드 및 리간드가 분해된 소스가스는 배기펌프에서 발생되는 열과 반응하지 않고, 반응가스와 작용하지 않으므로, 배기펌프의 내부로 유입된 리간드 및 리간드가 분해된 소스가스가 배기펌프의 내면에 증착되는 것을 방지할 수 있는 효과가 있을 수 있다. 그리고, 배기펌프의 내부에 쌓인 리간드 및 리간드가 분해된 소스가스가 폭발하는 것을 방지할 수 있는 효과가 있을 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)