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1. (WO2017061063) EPITAXIAL WAFER REAR SURFACE INSPECTION DEVICE AND EPITAXIAL WAFER REAR SURFACE INSPECTION METHOD USING SAME

Pub. No.:    WO/2017/061063    International Application No.:    PCT/JP2016/003583
Publication Date: Fri Apr 14 01:59:59 CEST 2017 International Filing Date: Thu Aug 04 01:59:59 CEST 2016
IPC: G01N 21/956
G01B 11/30
H01L 21/66
Applicants: SUMCO CORPORATION
株式会社SUMCO
Inventors: OSADA, Tatsuya
長田 達弥
KINBARA, Hideaki
金原 秀明
EGASHIRA, Masahiko
江頭 雅彦
Title: EPITAXIAL WAFER REAR SURFACE INSPECTION DEVICE AND EPITAXIAL WAFER REAR SURFACE INSPECTION METHOD USING SAME
Abstract:
Provided is an epitaxial wafer rear surface inspection device capable of detecting defects on the rear surface of an epitaxial wafer. An epitaxial wafer rear surface inspection device (100) according to the present invention is characterized by having: an optical system (30) that is disposed perpendicularly to the rear surface of an epitaxial wafer (1), and that is equipped with a ring fiber illumination (10) and a photographing unit (20); and a scan unit (40) that scans the optical system (30) in parallel to the rear surface, wherein the light source for the ring fiber illumination (10) is either a blue LED or a red LED.