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1. (WO2017060054) METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD, CONTROL SYSTEM FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS
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Pub. No.: WO/2017/060054 International Application No.: PCT/EP2016/071831
Publication Date: 13.04.2017 International Filing Date: 15.09.2016
IPC:
G03F 7/20 (2006.01) ,G03F 9/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
9
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Applicants: ASML NETHERLANDS B.V.[NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors: HULSEBOS, Edo, Maria; NL
TINNEMANS, Patricius, Aloysius Jacobus; NL
BRINKHOF, Ralph; NL
HERES, Pieter, Jacob; NL
LUCAS, Jorn, Kjeld; NL
VERHEES, Loek, Johannes, Petrus; NL
VAN DONKELAAR, Ingrid, Margaretha, Ardina; NL
BIJNEN, Franciscus, Godefridus, Casper; NL
Agent: PETERS, John; NL
Priority Data:
15188943.308.10.2015EP
Title (EN) METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD, CONTROL SYSTEM FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS
(FR) PROCÉDÉ DE COMMANDE D'UN APPAREIL LITHOGRAPHIQUE ET PROCÉDÉ DE FABRICATION DE DISPOSITIF, SYSTÈME DE COMMANDE POUR APPAREIL LITHOGRAPHIQUE ET APPAREIL LITHOGRAPHIQUE
Abstract:
(EN) In a method of controlling a lithographic apparatus, historical performance measurements (512) are used to calculate a process model (PM) relating to a lithographic process. Current positions of a plurality of alignment marks provided on a current substrate are measured (502) and used to calculate a substrate model relating to a current substrate. Additionally, historical position measurements (522) obtained at the time of processing the prior substrates are used (530) with the historical performance measurements to calculate a model mapping (M). The model mapping is applied (520) to modify the substrate model. The lithographic apparatus is controlled (508) using the process model and the modified substrate model (SM') together (PSM). Overlay performance is improved by avoiding over- or under-correction of correlated components of the process model and the substrate model. The model mapping may be a subspace mapping, and dimensionality of the model mapping may be reduced, before it is used.
(FR) L'invention porte sur un procédé de commande d'un appareil lithographique selon lequel on utilise des mesures de performances historiques (512) pour calculer un modèle de processus (PM) lié à un processus lithographique. On mesure (502) des positions actuelles d'une pluralité de repères d'alignement disposés sur un substrat actuel, et on les utilise pour calculer un modèle de substrat lié à un substrat actuel. On utilise (530) en outre, conjointement avec les mesures de performances historiques, des mesures de positions historiques (522) obtenues lors du traitement de substrats antérieurs afin de calculer un mapping de modèles (M). On applique (520) le mapping de modèles afin de modifier le modèle de substrat. On commande (508) l'appareil lithographique en utilisant conjointement le modèle de processus et le modèle de substrat modifié (SM') (PSM). On améliore les performances en matière de superposition en évitant une sur-correction ou une sous-correction de composantes corrélées du modèle de processus et du modèle de substrat. Le mapping de modèles pourra prendre la forme d'un mapping dans un sous-espace, et on pourra éventuellement réduire le nombre de dimensions du mapping de modèles avant son utilisation.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)