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1. (WO2017059607) ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR

Pub. No.:    WO/2017/059607    International Application No.:    PCT/CN2015/092357
Publication Date: Fri Apr 14 01:59:59 CEST 2017 International Filing Date: Thu Oct 22 01:59:59 CEST 2015
IPC: H01L 21/77
Applicants: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
深圳市华星光电技术有限公司
Inventors: SHI, Longqiang
石龙强
Title: ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR
Abstract:
An array substrate and a manufacturing method therefor. The method comprises: patterning a first metal layer by means of a first photomask so as to form a gate electrode (21) and a first conductor (22) which are arranged at an interval; patterning a semiconductor layer (40) and a gate insulating layer (30) by means of a second photomask so as to form a through hole (23) which is exposed out of the first conductor (22); patterning the semiconductor layer (40) by means of the gate electrode (21) and the first conductor (22) so as to form a first channel region (43) and a second channel region (44) which are arranged at an interval; and patterning a second metal layer by means of a third photomask so as to form a source electrode (51), a drain electrode (52) and a second conductor (53) which are arranged at intervals, wherein the second conductor (53) is in contact with the first conductor (22) via the through hole (23). By means of the manufacturing method for the array substrate, the semiconductor layer (40) and the gate insulating layer (30) are patterned by means of a photomask, so that the production costs of the array substrate are reduced, bridging between the first conductor (22) and the second conductor (53) is realized using a relatively simple method, and the production efficiency of the array substrate is further improved.