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1. (WO2017057944) COMPOSITION FOR FINE DUST PREVENTION CONTAINING NEGATIVELY CHARGED MATERIAL
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2017/057944    International Application No.:    PCT/KR2016/010965
Publication Date: 06.04.2017 International Filing Date: 30.09.2016
IPC:
A61K 8/37 (2006.01), A61K 8/34 (2006.01), A61K 8/36 (2006.01), A61K 8/81 (2006.01), A61K 8/02 (2006.01), A61Q 19/00 (2006.01)
Applicants: AMOREPACIFIC CORPORATION [KR/KR]; 106, Hangang-daero, Yongsan-gu, Seoul 04386 (KR)
Inventors: SUH, Yumi; (KR).
YI, Seung Hwan; (KR).
LEE, Hyunsuk; (KR)
Agent: KIM, Sun-young; (KR)
Priority Data:
10-2015-0137997 30.09.2015 KR
10-2016-0125750 29.09.2016 KR
Title (EN) COMPOSITION FOR FINE DUST PREVENTION CONTAINING NEGATIVELY CHARGED MATERIAL
(FR) COMPOSITION POUR LA PRÉVENTION DE POUSSIÈRE FINE CONTENANT UN MATÉRIAU NÉGATIVEMENT CHARGÉ
(KO) 음전하 물질을 포함하는 미세먼지 방진용 조성물
Abstract: front page image
(EN)The present specification discloses a composition for dust prevention containing an anionic emulsification stabilizer or a thickener. In an aspect, the composition for dust prevention of the present invention can minimize the penetration of dust, especially, fine dust, into the skin. Specifically, a negatively charged material contained as an active ingredient in the composition for dust prevention has a similar negative charge zeta potential to dust, and thus can minimize the attachment of dust on the skin surface by electrostatic force. In addition, even though dust penetrates into the cosmetic composition coated on the skin, the dust floats in the emulsion stabilizer or thickener, and thus, the cosmetic composition can prevent the penetration of dust into the skin. Especially, the cosmetic composition can prevent the penetration of fine dust into the skin to minimize the skin inflammation and the accumulation of heavy metals due to the penetration of fine dust, and thus is beneficial for skin health.
(FR)La présente invention concerne une composition pour la prévention de poussière contenant un stabilisant d’émulsification anionique ou un épaississant. Dans un aspect, la composition pour la prévention de poussière de la présente invention peut réduire au minimum la pénétration de poussière, en particulier de poussière fine, dans la peau. Spécifiquement, un matériau négativement chargé contenu en tant que substance active dans la composition pour la prévention de poussière possède un potentiel zêta de charge négative similaire à la poussière, et peut ainsi réduire au minimum la fixation de la poussière sur la surface de la peau par une force électrostatique. En outre, même si la poussière pénètre dans la composition cosmétique appliquée sur la peau, la poussière flotte dans le stabilisateur d’émulsion ou l’épaississant, et ainsi, la composition cosmétique peut empêcher la pénétration de poussière dans la peau. En particulier, la composition cosmétique peut empêcher la pénétration de poussière fine dans la peau afin de réduire l’inflammation de la peau et l’accumulation de métaux lourds due à la pénétration de poussière fine et, par exemple, est bénéfique pour la santé de la peau.
(KO)본 명세서에는 음이온성 유화안정제 또는 증점제를 포함하는 방진용 조성물이 개시된다. 일 측면에 있어서, 본 발명의 방진용 조성물은, 먼지, 특히 미세먼지가 피부로 침투하는 것을 최소화할 수 있다. 구체적으로, 방진용 조성물에 유효성분으로 포함된 음전하 물질은, 먼지와 유사한 음전하의 제타전위를 가지므로, 정전기적 힘에 의해 먼지가 피부 표면에 부착되는 것을 최소화할 수 있다. 또한, 피부에 도포된 화장료 조성물 내로 먼지가 침투하더라도, 유화안정제 또는 증점제 내에 먼지가 부유하게 되어, 먼지가 피부로 침투하는 것을 방지할 수 있다. 특히, 미세먼지의 피부 침투를 방지하여, 이로 인한 피부 염증, 중금속 축적을 최소화할 수 있어서, 피부 건강에 유익하다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)