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1. (WO2017057273) ELECTROSTATIC CHUCK
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Pub. No.: WO/2017/057273 International Application No.: PCT/JP2016/078267
Publication Date: 06.04.2017 International Filing Date: 26.09.2016
IPC:
C04B 35/111 (2006.01) ,H01L 21/683 (2006.01) ,H02N 13/00 (2006.01)
C CHEMISTRY; METALLURGY
04
CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
B
LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
35
Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
01
based on oxides
10
based on aluminium oxide
111
Fine ceramics
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
H ELECTRICITY
02
GENERATION, CONVERSION, OR DISTRIBUTION OF ELECTRIC POWER
N
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
13
Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Applicants:
日本碍子株式会社 NGK INSULATORS, LTD. [JP/JP]; 愛知県名古屋市瑞穂区須田町2番56号 2-56, Suda-cho, Mizuho-ku, Nagoya-city, Aichi 4678530, JP
Inventors:
渡邊 守道 WATANABE, Morimichi; JP
七瀧 努 NANATAKI, Tsutomu; JP
Agent:
特許業務法人アイテック国際特許事務所 ITEC INTERNATIONAL PATENT FIRM; 愛知県名古屋市中区錦二丁目16番26号SC伏見ビル SC Fushimi Bldg., 16-26, Nishiki 2-chome, Naka-ku, Nagoya-shi, Aichi 4600003, JP
Priority Data:
2015-19394330.09.2015JP
2015-19394430.09.2015JP
2016-10072019.05.2016JP
Title (EN) ELECTROSTATIC CHUCK
(FR) PORTE-SUBSTRAT ÉLECTROSTATIQUE
(JA) 静電チャック
Abstract:
(EN) An electrostatic chuck 10 according to an embodiment of the present invention has an electrostatic electrode 14 disposed between a dielectric layer 12 and a ceramic layer 16. The dielectric layer 12 comprises an oriented alumina sintered body having a surface with a c-plane orientation of at least 5%, said c-plane orientation being obtained by way of the Lotgering method using an X-ray diffraction profile in the range of 2θ=20 to 70˚ when irradiating with X-rays. The ceramic layer 16 is integrated with the surface of the dielectric layer 12 at the opposite side to a wafer placement surface 12a.
(FR) Cette invention concerne un porte-substrat électrostatique 10 comprenant une électrode électrostatique 14 située entre une couche diélectrique 12 et une couche céramique 16. La couche diélectrique 12 comprend un corps fritté en alumine orienté pourvu d'une surface ayant une orientation dans le plan c d'au moins 5 %, ladite orientation dans le plan c étant obtenue au moyen du procédé de Lotgering à l'aide d'un profil de diffraction des rayons X dans la plage de 2θ = 20 à 70° quand elle est exposée à des rayons X. La couche céramique 16 est intégrée à la surface de la couche diélectrique 12 du côté opposé à une surface de placement d'une tranche de silicium 12a.
(JA) 本実施形態の静電チャック10は、誘電体層12とセラミックス層16との間に静電電極14が存在している。誘電体層12は、X線を照射したときの2θ=20°~70°の範囲におけるX線回折プロファイルを用いてロットゲーリング法により求めたc面配向度が5%以上の面を有する配向アルミナ焼結体からなる。セラミックス層16は、誘電体層12のウエハー載置面12aとは反対側の面に一体化されている。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)