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1. (WO2017056916) METHOD FOR PRODUCING RUTHENIUM COMPLEX
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Pub. No.: WO/2017/056916 International Application No.: PCT/JP2016/076564
Publication Date: 06.04.2017 International Filing Date: 09.09.2016
IPC:
C07F 19/00 (2006.01) ,C07B 61/00 (2006.01) ,C07F 9/50 (2006.01) ,C07F 15/00 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
19
Metal compounds according to more than one of main groups C07F1/-C07F17/110
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
B
GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
61
Other general methods
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
9
Compounds containing elements of the 5th Group of the Periodic System
02
Phosphorus compounds
28
with one or more P-C bonds
50
Organo-phosphines
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
15
Compounds containing elements of the 8th Group of the Periodic System
Applicants:
高砂香料工業株式会社 TAKASAGO INTERNATIONAL CORPORATION [JP/JP]; 東京都大田区蒲田五丁目37番1号 37-1, Kamata 5-chome, Ota-ku, Tokyo 1448721, JP
Inventors:
中山 裕治 NAKAYAMA Yuji; JP
Agent:
特許業務法人栄光特許事務所 EIKOH PATENT FIRM, P.C.; 東京都港区西新橋一丁目7番13号 虎ノ門イーストビルディング10階 Toranomon East Bldg. 10F, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003, JP
Priority Data:
2015-19355230.09.2015JP
Title (EN) METHOD FOR PRODUCING RUTHENIUM COMPLEX
(FR) PROCÉDÉ DE PRODUCTION D'UN COMPLEXE DE RUTHÉNIUM
(JA) ルテニウム錯体の製造方法
Abstract:
(EN) The present invention pertains to a method for efficiently producing a ruthenium complex (1A) by reacting a binuclear ruthenium complex (2A) with a compound (3A) in the presence of a primary alcohol and a base. The ruthenium complex (1A) can also be efficiently produced by allowing a primary alcohol and a base to act on a binuclear ruthenium complex (4A). (In the formulas, solid lines, triple lines, dashed lines, C, H, N, OP, Ru, X, AH and R1 to R12 have the meanings defined in the specification.)
(FR) La présente invention concerne un procédé pour la production efficace d'un complexe de ruthénium (1A) par la réaction d'un complexe de ruthénium binucléaire (2A) avec un composé (3A) en présence d'un alcool primaire et d'une base. Le complexe de ruthénium (1A) peut également être produit efficacement par le fait de laisser agir un alcool primaire et une base sur un complexe de ruthénium binucléaire (4A). (Dans les formules, les lignes continues, les lignes triples, les lignes pointillées, C, H, N, OP, Ru, X, AH et R1 à R12 ont les significations définies dans la description.)
(JA) 本発明は、ルテニウム二核錯体(2)と化合物(3)を第1級アルコール及び塩基の存在下で反応させることにより、ルテニウム錯体(1)を効率的に製造する方法に関する。また、ルテニウム二核錯体(4)に対して第1級アルコールと塩基を作用させることによっても、ルテニウム錯体(1)を効率的に製造することが出来る。 (式中、実線、三重線、破線、C、H、N、O、P、Ru、X、AH及びR~R12は明細書中に定義された意味を有する)
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)