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1. (WO2017056805) PATTERN FORMATION METHOD, ELECTRONIC DEVICE PRODUCTION METHOD, AND LAMINATE

Pub. No.:    WO/2017/056805    International Application No.:    PCT/JP2016/074957
Publication Date: Fri Apr 07 01:59:59 CEST 2017 International Filing Date: Sat Aug 27 01:59:59 CEST 2016
IPC: G03F 7/11
G03F 7/038
G03F 7/039
G03F 7/32
H01L 21/027
Applicants: FUJIFILM CORPORATION
富士フイルム株式会社
Inventors: TSUBAKI Hideaki
椿 英明
NIHASHI Wataru
二橋 亘
TSUCHIHASHI Toru
土橋 徹
YAMAMOTO Kei
山本 慶
Title: PATTERN FORMATION METHOD, ELECTRONIC DEVICE PRODUCTION METHOD, AND LAMINATE
Abstract:
Provided are: a pattern formation method whereby high resolution can be obtained during formation of an ultra-fine residual pattern; and a production method for an electronic device, including this pattern formation method. The pattern formation method includes: (a) a step in which an actinic ray-sensitive or radiation-sensitive film is formed using an actinic ray-sensitive or radiation-sensitive composition; (b) a step in which an upper layer film is formed upon the actinic ray-sensitive or radiation-sensitive film, using an upper layer film formation composition; (c) a step in which the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereupon is exposed; and (d) a step in which the exposed actinic ray-sensitive or radiation-sensitive film is developed using a development fluid containing an organic solvent. The upper layer film formation composition includes at least one out of: a compound that generates acid by using active light rays or radiation; a compound that generates acid by using heat; or acid. This electronic device production method includes said pattern formation method. The laminate includes the actinic ray-sensitive or radiation-sensitive film and the upper layer film.