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1. (WO2017056746) FILM-FORMING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE CLEANING, AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE

Pub. No.:    WO/2017/056746    International Application No.:    PCT/JP2016/073501
Publication Date: Fri Apr 07 01:59:59 CEST 2017 International Filing Date: Wed Aug 10 01:59:59 CEST 2016
IPC: H01L 21/304
C11D 3/37
C11D 3/43
C11D 17/04
Applicants: JSR CORPORATION
JSR株式会社
Inventors: CHUNG Kang-go
鄭 康巨
MATSUMURA Yuushi
松村 裕史
TAKIMOTO Yoshio
滝本 嘉夫
Title: FILM-FORMING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE CLEANING, AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE
Abstract:
The present invention is a film-forming composition for semiconductor substrate cleaning, the composition containing a solvent and a compound that has a molecular weight of 300 or greater and has a polar group, a group represented by the formula (i), or a combination thereof. In the formula (i), R1 is a group that is caused to dissociate by the action of an acid or heat. The polar group is preferably a hydroxy group, a carboxy group, an amide group, an amino group, a sulfonyl group, a sulfo group, or a combination thereof. Preferably, the compound contains a polymer, and the polymer has a weight-average molecular weight of 300-50,000. Preferably, the polymer is a cyclic polymer, and the cyclic polymer has a weight-average molecular weight of 300-3,000. ―O―R1(i)