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1. (WO2017055394) LUMINESCENT SUBSTRATE CONTAINING ABRASIVE PARTICLES, AND METHOD FOR THE PRODUCTION THEREOF
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2017/055394 International Application No.: PCT/EP2016/073177
Publication Date: 06.04.2017 International Filing Date: 29.09.2016
IPC:
B24D 3/34 (2006.01)
Applicants: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES[FR/FR]; 25 Rue Leblanc Bâtiment "Le Ponant D" 75015 Paris, FR
THERMOCOMPACT[FR/FR]; Zone Industrielle Les Iles 181 Route de Sarves 74370 Metz Tessy, FR
Inventors: DEBOURDEAU, Mathieu; FR
CHABLI, Amal; FR
COUSTIER, Fabrice; FR
LAGUITTON, Bruno; FR
SIMONATO, Jean-Pierre; FR
Agent: VUILLERMOZ, Bruno; FR
PALIX, Stéphane; FR
DENJEAN, Eric; FR
BUCHET, Anne; FR
THIVILLIER, Patrick; FR
Priority Data:
155928130.09.2015FR
Title (EN) LUMINESCENT SUBSTRATE CONTAINING ABRASIVE PARTICLES, AND METHOD FOR THE PRODUCTION THEREOF
(FR) SUBSTRAT LUMINESCENT CONTENANT DES PARTICULES ABRASIVES, ET SON PROCEDE DE PREPARATION
Abstract: front page image
(EN) The invention relates to an abrasive sawing or polishing substrate comprising: a substrate; a binder C1 covering at least part of the substrate; abrasive particles having an at least partial coating C2; a coating C3 covering the binder C1 and the abrasive particles coated with C2; and at least one luminescent compound. The abrasive particles coated with C2 are in contact with the binder C1 and with the coating C3.
(FR) Ce substrat abrasif de sciage ou de polissage, comprend : un substrat; un liant C1 recouvrant au moins une partie du substrat; des particules abrasives présentant un enrobage, au moins partiel, C2; un revêtement C3 recouvrant le liant C1 et les particules abrasives enrobées de C2; au moins un composé luminescent. Les particules abrasives enrobées de C2 étant en contact avec le liant C1 et avec le revêtement C3.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)