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1. (WO2017055106) METROLOGY METHOD, TARGET AND SUBSTRATE

Pub. No.:    WO/2017/055106    International Application No.:    PCT/EP2016/071986
Publication Date: Fri Apr 07 01:59:59 CEST 2017 International Filing Date: Sat Sep 17 01:59:59 CEST 2016
IPC: G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: SLOTBOOM, Daan, Maurits
DEN BOEF, Arie, Jeffrey
EBERT, Martin
Title: METROLOGY METHOD, TARGET AND SUBSTRATE
Abstract:
A method of measuring a parameter of a lithographic process, the method including: illuminating a diffraction measurement target on a substrate with radiation, the measurement target including at least a first sub-target, at least a second sub-target and at least third sub-target, wherein the first, second and third sub-targets each include a periodic structure and wherein the first sub-target, second sub-target and third sub-target each have a different design and wherein at least two of the sub-targets are respectively designed for determination of a different lithographic process parameter; and detecting radiation scattered by the at least two sub-targets to obtain for that target a measurement representing the different parameters of the lithographic process.