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1. (WO2017054120) METHOD OF MAKING MULTILAYER STRUCTURE

Pub. No.:    WO/2017/054120    International Application No.:    PCT/CN2015/091039
Publication Date: Fri Apr 07 01:59:59 CEST 2017 International Filing Date: Wed Sep 30 01:59:59 CEST 2015
IPC: H01G 11/32
H01G 11/34
H01G 11/46
H01M 4/48
Applicants: ROHM AND HAAS ELECTRONIC MATERIALS LLC
DOW GLOBAL TECHNOLOGIES LLC
WANG, Deyan
WANG, Xiuyan
FENG, Shaoguang
LI, Qiaowei
PANG, Qingqing
TREFONAS, Peter III
LU, Zhijian
CHEN, Hongyu
Inventors: WANG, Deyan
WANG, Xiuyan
FENG, Shaoguang
LI, Qiaowei
PANG, Qingqing
TREFONAS, Peter III
LU, Zhijian
CHEN, Hongyu
Title: METHOD OF MAKING MULTILAYER STRUCTURE
Abstract:
A method of making a multilayer structure is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier and a MX/graphitic carbon precursor material having a formula (I); disposing the coating composition on the substrate to form a composite; optionally, baking the composite; annealing the composite under a forming gas atmosphere; whereby the composite is converted into an MX layer and a graphitic carbon layer disposed on the substrate providing the multilayer structure; wherein the MX layer is interposed between the substrate and the graphitic carbon layer in the multilayer structure.