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1. (WO2017041126) METHOD FOR TEXTURING POLYIMIDE SURFACES
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Pub. No.: WO/2017/041126 International Application No.: PCT/AT2016/060053
Publication Date: 16.03.2017 International Filing Date: 08.09.2016
IPC:
H01L 31/0236 (2006.01) ,H01L 31/0392 (2006.01) ,H05K 3/38 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
02
Details
0236
Special surface textures
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
0248
characterised by their semiconductor bodies
036
characterised by their crystalline structure or particular orientation of the crystalline planes
0392
including thin films deposited on metallic or insulating substrates
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
K
PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
3
Apparatus or processes for manufacturing printed circuits
38
Improvement of the adhesion between the insulating substrate and the metal
Applicants:
TECHNISCHE UNIVERSITÄT WIEN [AT/AT]; Karlsplatz 13 1040 Wien, AT
Inventors:
BEDNAR, Nikola; AT
ADAMOVIC, Nadja; AT
Agent:
ELLMEYER, Wolfgang; AT
Priority Data:
A 593/201511.09.2015AT
Title (EN) METHOD FOR TEXTURING POLYIMIDE SURFACES
(FR) PROCÉDÉ DE TEXTURATION DE SURFACES DE POLYIMIDE
(DE) VERFAHREN ZUR TEXTURIERUNG VON POLYIMIDOBERFLÄCHEN
Abstract:
(EN) The invention relates to a method for texturing the surface of polyimide films by means of oxygen plasma treatment, characterized in that the product of the multiplication of the power (in W) applied to generate the oxygen plasma with the treatment duration (in min) satisfies the following equation: power (W) x time (min) ≈ 800-2000 (W.min); provided that the power value is greater than 50 W and not greater than 500 W.
(FR) L'invention concerne un procédé de texturation de la surface de feuilles de polyimide au moyen d'un traitement au plasma d'oxygène, ledit procédé étant caractérisé en ce que le produit de la multiplication de la puissance (en W) appliquée pour la production du plasma d'oxygène par la durée de traitement (en min) satisfait à l'équation suivante : puissance (W) X durée (min) ≈ 800-2000 (W.min) ; à condition que la valeur de puissance soit supérieure à 50 W et ne dépasse pas 500 W.
(DE) Die Erfindung betrifft ein Verfahren zur Texturierung der Oberfläche von Polyimidfolien mittels Sauerstoffplasma-Behandlung, das dadurch gekennzeichnet ist, dass das Produkt der Multiplikation der zur Erzeugung des Sauerstoffplasmas angewandten Leistung (in W) mit der Behandlungsdauer (in min) der folgenden Gleichung genügt: Leistung (W) x Zeit (min) ≈ 800-2000 (W.min); mit der Maßgabe, dass der Leistungswert größer als 50 W und nicht größer als 500 W ist.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)