Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2017040213) RESISTIVE-CAPACITIVE DEFORMATION SENSOR
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2017/040213 International Application No.: PCT/US2016/048734
Publication Date: 09.03.2017 International Filing Date: 25.08.2016
IPC:
G01L 15/00 (2006.01) ,G01D 21/02 (2006.01) ,G01L 1/14 (2006.01) ,G01L 1/20 (2006.01)
G PHYSICS
01
MEASURING; TESTING
L
MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
15
Devices or apparatus for measuring two or more fluid pressure values simultaneously
G PHYSICS
01
MEASURING; TESTING
D
MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED BY A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; TRANSFERRING OR TRANSDUCING ARRANGEMENTS NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
21
Measuring or testing not otherwise provided for
02
Measuring two or more variables by means not covered by a single other subclass
G PHYSICS
01
MEASURING; TESTING
L
MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
1
Measuring force or stress, in general
14
by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators
G PHYSICS
01
MEASURING; TESTING
L
MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
1
Measuring force or stress, in general
20
by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
Applicants:
OCULUS VR, LLC [US/US]; 1601 Willow Road Menlo Park, CA 94025, US
Inventors:
KELLER, Sean; US
TRUTNA, Tristan; US
PEREK, David; US
CLEARY, Bruce; US
Agent:
HULSE, Robert, A.; US
BUSH, Jennifer, R.; US
AHN, Dohyun; US
CATHEY, Charles, D.; US
BRANNON, Brian, G.; US
Priority Data:
14/843,06702.09.2015US
Title (EN) RESISTIVE-CAPACITIVE DEFORMATION SENSOR
(FR) CAPTEUR DE DÉFORMATION RÉSISTIF-CAPACITIF
Abstract:
(EN) A deformation sensing apparatus comprises an elastic substrate, a first strain-gauge element formed on a first surface of the elastic substrate, and configured to output a first signal in responser to a strain applied in a first direction, and a second strain-gauge element formed on a second surface of the elastic substrate opposite to the first surface, and configured to output a second signal in response to a strain applied in the same first direction.
(FR) L'invention concerne un appareil de détection de déformation qui comprend un substrat élastique, un premier élément à jauge de contrainte formé sur une première surface du substrat élastique, et conçu de façon à délivrer en sortie un premier signal en réaction à une contrainte appliquée dans une première direction, et un second élément à jauge de contrainte formé sur une seconde surface du substrat élastique face à la première surface, et conçu de façon à délivrer en sortie un second signal en réaction à une contrainte appliquée dans la même première direction.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)