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1. (WO2017040054) ELECTROPLATING PROCESSOR WITH CURRENT THIEF ELECTRODE

Pub. No.:    WO/2017/040054    International Application No.:    PCT/US2016/047586
Publication Date: Fri Mar 10 00:59:59 CET 2017 International Filing Date: Fri Aug 19 01:59:59 CEST 2016
IPC: C25D 17/00
C25D 17/10
C25D 17/06
C25D 5/16
C25D 7/12
H01L 21/288
Applicants: APPLIED MATERIALS, INC.
Inventors: WILSON, Gregory, J.
MCHUGH, Paul, R.
Title: ELECTROPLATING PROCESSOR WITH CURRENT THIEF ELECTRODE
Abstract:
An electroplating processor has a head including a wafer holder, with the head movable to position a wafer in the wafer holder into a vessel holding a first electrolyte and having one or more anodes. A thief electrode assembly may be positioned adjacent to a lower end of the vessel, or below the anode. A thief current channel extends from the thief electrode assembly to a virtual thief position adjacent to the wafer holder. A thief electrode in the thief electrode assembly is positioned within a second electrolyte which is separated from the first electrolyte by a membrane. Alternatively, two membranes may be used with an isolation solution between them. The processor avoids plating metal onto the thief electrode, even when processing redistribution layer and wafer level packaging wafers having high amp-minute electroplating characteristics.