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1. (WO2017039875) METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USING FERRITE MATERIALS FOR RF FILTER APPLICATIONS IN PLASMA CHAMBERS

Pub. No.:    WO/2017/039875    International Application No.:    PCT/US2016/043918
Publication Date: Fri Mar 10 00:59:59 CET 2017 International Filing Date: Tue Jul 26 01:59:59 CEST 2016
IPC: H01L 21/02
H01L 21/67
H01L 21/683
H05H 1/46
Applicants: APPLIED MATERIALS, INC.
Inventors: YE, John Zheng
KHAJA, Abdul Aziz
BANSAL, Amit Kumar
LEE, Kwangduk Douglas
LIN, Xing
ZHOU, Jianhua
SUSMITA, Addepalli Sai
ROCHA-ALVAREZ, Juan Carlos
Title: METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USING FERRITE MATERIALS FOR RF FILTER APPLICATIONS IN PLASMA CHAMBERS
Abstract:
Implementations of the present disclosure generally relate to methods and apparatus for generating and controlling plasma, for example RF filters, used with plasma chambers. In one implementation, a plasma processing apparatus is provided. The plasma processing apparatus comprises a chamber body, a powered gas distribution manifold enclosing a processing volume and a radio frequency (RF) filter. A pedestal having a substrate-supporting surface is disposed in the processing volume. A heating assembly comprising one or more heating elements is disposed within the pedestal for controlling a temperature profile of the substrate-supporting surface. A tuning assembly comprising a tuning electrode is disposed within the pedestal between the one or more heating elements and the substrate-supporting surface. The RF filter comprises an air core inductor, wherein at least one of the heating elements, the tuning electrode, and the gas distribution manifold is electrically coupled to the RF filter.