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1. (WO2017038645) MATERIAL FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, PATTERN FORMING METHOD, RESIN, AND PURIFICATION METHOD

Pub. No.:    WO/2017/038645    International Application No.:    PCT/JP2016/074867
Publication Date: Fri Mar 10 00:59:59 CET 2017 International Filing Date: Fri Aug 26 01:59:59 CEST 2016
IPC: G03F 7/11
C07D 311/78
G03F 7/26
H01L 21/027
Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC.
三菱瓦斯化学株式会社
Inventors: TOIDA, Takumi
樋田 匠
MAKINOSHIMA, Takashi
牧野嶋 高史
SATO, Takashi
佐藤 隆
ECHIGO, Masatoshi
越後 雅敏
Title: MATERIAL FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, PATTERN FORMING METHOD, RESIN, AND PURIFICATION METHOD
Abstract:
The present embodiment provides a material is for forming underlayer films for lithography and contains a compound represented by formula (1) and/or a resin including a structural unit derived from the compound represented by formula (1). (In formula (1), R1 represents a single bond or a 2n-valent group having 1-60 carbon atoms, each R2 independently represents: a halogen atom; a linear, a branched, or a cyclic alkyl group having 1-10 carbon atoms; an aryl group having 6-10 carbon atoms; an alkenyl group having 2-10 carbon atoms; an alkoxy group having 1-30 carbon atoms; a thiol group; a hydroxyl group; or a group obtained by substituting an acid dissociable group for the hydrogen atom in a hydroxyl group, each R2 may be different or identical in the same naphthalene ring or benzene ring, at least one R2 is a group obtained by substituting an acid dissociable group for the hydrogen atom in a hydroxyl group, n represents an integer of 1-4, structural formulae of the n-number of structural units inside the square brackets may be identical or different from each other when n is an integer equal to or greater than two, X represents an oxygen atom, a sulfur atom, or no cross-linkage, each m2 independently represents an integer of 0-7, however, at least one m2 is an integer of 1-7, and each q independently represents 0 or 1.)