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1. (WO2017038587) CURABLE COMPOSITION, METHOD FOR MANUFACTURING CURED FILM, COLOR FILTER, LIGHT-SHIELDING FILM, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
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Pub. No.: WO/2017/038587 International Application No.: PCT/JP2016/074682
Publication Date: 09.03.2017 International Filing Date: 24.08.2016
IPC:
C08F 2/44 (2006.01) ,C08F 265/04 (2006.01) ,C08F 290/12 (2006.01) ,G02B 5/20 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/033 (2006.01) ,G03F 7/038 (2006.01) ,H01L 27/14 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
44
Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
265
Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/181
04
on to polymers of esters
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
290
Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
08
on to polymers modified by introduction of unsaturated side groups
12
Polymers provided for in subclasses C08C or C08F76
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
033
the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
14
including semiconductor components sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
小川 倫弘 OGAWA Michihiro; JP
高桑 英希 TAKAKUWA Hideki; JP
留場 恒光 TOMEBA Hisamitsu; JP
Agent:
渡辺 望稔 WATANABE Mochitoshi; JP
三和 晴子 MIWA Haruko; JP
伊東 秀明 ITOH Hideaki; JP
三橋 史生 MITSUHASHI Fumio; JP
Priority Data:
2015-17159331.08.2015JP
Title (EN) CURABLE COMPOSITION, METHOD FOR MANUFACTURING CURED FILM, COLOR FILTER, LIGHT-SHIELDING FILM, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
(FR) COMPOSITION DURCISSABLE, PROCÉDÉ DE FABRICATION DE FILM DURCI, FILTRE COULEUR, FILM DE PROTECTION CONTRE LA LUMIÈRE, ÉLÉMENT D’IMAGERIE À SEMI-CONDUCTEUR, ET DISPOSITIF D’AFFICHAGE D’IMAGE
(JA) 硬化性組成物、硬化膜の製造方法、カラーフィルタ、遮光膜、固体撮像素子及び画像表示装置
Abstract:
(EN) The purpose of the present invention is to provide a curable composition whereby excellent antireflective properties and development properties are obtained at the same time, a method for manufacturing a cured film, an infrared cutoff filter provided with a light-shielding film, and a solid-state imaging device. This curable composition includes a fluorine-containing polymer including repeating units represented by formula (A) and repeating units represented by formula (B), a polymerizable compound, and a colorant. In formula (A), R1 represents a hydrogen atom or an alkyl group, and L1 represents a chain divalent linking group having a total carbon number of 3 or greater and which may include an ester bond. In formula (B), R2 represents a hydrogen atom or an alkyl group, L2 represents a single bond or a divalent linking group, and Rf represents a monovalent organic group including a fluorine atom.
(FR) L’objectif de la présente invention est de fournir une composition durcissable au moyen de laquelle d’excellentes propriétés antireflet et propriétés de développement sont obtenues simultanément, un procédé de fabrication d’un film durci, un filtre de coupure infrarouge pourvu d’un film de protection contre la lumière, et un dispositif d’imagerie à semi-conducteur. Cette composition durcissable comprend un polymère contenant du fluor comprenant des motifs de répétition représentés par la formule (A) et des motifs de répétition représentés par la formule (B), un composé polymérisable et un colorant. Dans la formule (A), R1 représente un atome d’hydrogène ou un groupe alkyle, et L1 représente un groupe de liaison à chaîne divalente ayant un nombre total de carbones de 3 ou plus et qui peut comprendre une liaison ester. Dans la formule (B), R2 représente un atome d’hydrogène ou un groupe alkyle, L2 représente une simple liaison ou un groupe de liaison divalent, et Rf représente un groupe organique monovalent comprenant un atome de fluor.
(JA) 本発明の目的は、優れた低反射性と現像性とを両立する硬化性組成物、硬化膜の製造方法、遮光膜付き赤外光カットフィルタ及び固体撮像装置を提供することにある。 本発明の硬化性組成物は、下記式(A)で表される繰り返し単位と、下記式(B)で表される繰り返し単位とを含むフッ素含有ポリマーと、重合性化合物と、着色剤と、を含む。式(A)中、Rは、水素原子又はアルキル基を表し、Lは、エステル結合を含んでいてもよい、総炭素数3以上の鎖状の2価の連結基を表す。 式(B)中、Rは、水素原子又はアルキル基を表し、Lは、単結合又は2価の連結基を表し、Rはフッ素原子を含む1価の有機基を表す。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)