Search International and National Patent Collections
|1. (WO2017038476) ATOMIC BEAM SOURCE|
|Applicants:||NGK INSULATORS, LTD.
|Title:||ATOMIC BEAM SOURCE|
An atomic beam source 10 is provided with: a tubular cathode 20 that includes a discharge portion 30 having provided therein discharge ports 32 through which atomic beams can be discharged; a rod-like first anode 40 provided inside the cathode 20; and a rod-like second anode 50 provided inside the cathode 20 so as to be separated from the first anode 40. At least one selected from the group consisting of the shape of the cathode 20, the shape of the first anode 40, the shape of the second anode 50, and the positional relationship among the cathode 20, the first anode 40, and the second anode 50, has a predetermined configuration. Thus, the atomic beam source 10 suppresses discharge of sputtered particles, which is caused by collision of cations generated by plasma between the first anode 40 and the second anode 50, with at least one of the cathode 20, the first anode 40, and the second anode 50.