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1. (WO2017038377) IMAGE PROCESSING APPARATUS FOR SEMICONDUCTOR PATTERN IMAGE

Pub. No.:    WO/2017/038377    International Application No.:    PCT/JP2016/073026
Publication Date: Fri Mar 10 00:59:59 CET 2017 International Filing Date: Sat Aug 06 01:59:59 CEST 2016
IPC: G06T 7/00
G06T 1/00
G06T 7/60
Applicants: HITACHI HIGH-TECHNOLOGIES CORPORATION
株式会社 日立ハイテクノロジーズ
Inventors: USHIBA Hiroyuki
牛場 郭介
ABE Yuichi
安部 雄一
NAGATOMO Wataru
長友 渉
Title: IMAGE PROCESSING APPARATUS FOR SEMICONDUCTOR PATTERN IMAGE
Abstract:
The purpose of the present invention is to provide an image processing apparatus capable of performing a highly robust matching process irrespective of pattern misalignment, deformation, or the like included in a high-density pattern. The present invention proposes an image processing apparatus that calculates a matching result between a pattern and reference data on the basis of a comparison between a feature value obtained by calculating the curvature of a specific part of an edge of a pattern extracted from an image to be search and a feature value extracted from the reference data, or on the basis of a comparison between classification information allocated according to the feature value of the specific part of the edge extracted from the image and classification information extracted from the reference data.