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|1. (WO2017038377) IMAGE PROCESSING APPARATUS FOR SEMICONDUCTOR PATTERN IMAGE|
|Applicants:||HITACHI HIGH-TECHNOLOGIES CORPORATION
|Title:||IMAGE PROCESSING APPARATUS FOR SEMICONDUCTOR PATTERN IMAGE|
The purpose of the present invention is to provide an image processing apparatus capable of performing a highly robust matching process irrespective of pattern misalignment, deformation, or the like included in a high-density pattern. The present invention proposes an image processing apparatus that calculates a matching result between a pattern and reference data on the basis of a comparison between a feature value obtained by calculating the curvature of a specific part of an edge of a pattern extracted from an image to be search and a feature value extracted from the reference data, or on the basis of a comparison between classification information allocated according to the feature value of the specific part of the edge extracted from the image and classification information extracted from the reference data.