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1. (WO2017038201) METHOD FOR PRODUCING GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM, METHOD FOR PRODUCING INFORMATION RECORDING MEDIUM, INFORMATION RECORDING MEDIUM GLASS SUBSTRATE, AND MAGNETIC RECORDING MEDIUM
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2017/038201 International Application No.: PCT/JP2016/067643
Publication Date: 09.03.2017 International Filing Date: 14.06.2016
IPC:
G11B 5/84 (2006.01) ,C03C 19/00 (2006.01) ,G11B 5/73 (2006.01)
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
84
Processes or apparatus specially adapted for manufacturing record carriers
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
C
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
19
Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
62
Record carriers characterised by the selection of the material
73
Base layers
Applicants:
旭硝子株式会社 ASAHI GLASS COMPANY, LIMITED [JP/JP]; 東京都千代田区丸の内一丁目5番1号 5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008405, JP
Inventors:
蕭 桂瑛 XIAO, Guiying; JP
▲高▼木 靖之 TAKAGI, Nobuyuki; JP
中嶋 徳夫 NAKASHIMA, Norio; JP
岡田 浩一 OKADA, Kouichi; JP
宮谷 克明 MIYATANI, Katsuaki; JP
Agent:
伊東 忠重 ITOH, Tadashige; JP
Priority Data:
2015-17272702.09.2015JP
Title (EN) METHOD FOR PRODUCING GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM, METHOD FOR PRODUCING INFORMATION RECORDING MEDIUM, INFORMATION RECORDING MEDIUM GLASS SUBSTRATE, AND MAGNETIC RECORDING MEDIUM
(FR) PROCÉDÉ DE PRODUCTION D'UN SUBSTRAT EN VERRE POUR SUPPORT D'ENREGISTREMENT D'INFORMATIONS, PROCÉDÉ DE PRODUCTION DE SUPPORT D'ENREGISTREMENT D'INFORMATIONS, SUBSTRAT EN VERRE DE SUPPORT D'ENREGISTREMENT D'INFORMATIONS, ET SUPPORT D'ENREGISTREMENT MAGNÉTIQUE
(JA) 情報記録媒体用ガラス基板の製造方法、情報記録媒体の製造方法、情報記録媒体用ガラス基板、並びに磁気記録媒体
Abstract:
(EN) [Problem] The present invention provides an information recording medium glass substrate production method, the glass substrate having a very low Ra and being able to sufficiently support higher recording capacity and higher accuracy, which will be sought in the future. [Solution] By means of a rough polishing step for polishing the main surface of a glass substrate, the glass substrate is produced, the main surface of which has an arithmetic average roughness Ra of 0.2 nm or less if measured using an atomic force microscope at a resolution of 256×256 pixels and a scan size of 1×1 μm, and thereafter the glass substrate is polished by means of a finish polishing step for polishing using a polishing slurry including at least one type of abrasive grain selected from the group consisting of diamond, aluminum oxide, and cerium oxide having an average particle size of 15 nm or less.
(FR) Le problème abordé par la présente invention concerne un procédé de production de substrat en verre de support d'enregistrement d'informations, le substrat en verre ayant une Ra très faible et étant capable de supporter une capacité d'enregistrement supérieure et une précision supérieure, qui seront recherchées dans le futur. Selon la solution décrite par l'invention, au moyen d'une étape de polissage grossier pour polir la surface principale d'un substrat en verre, il est produit le substrat en verre dont la surface principale a une rugosité moyenne arithmétique Ra inférieure ou égale à 0,2 nm si elle est mesurée à l'aide d'un microscope à force atomique à une résolution de 256 x 256 pixels et une dimension de balayage de 1 x 1 μm, et, par la suite, le substrat en verre est poli au moyen d'une étape de polissage de finition pour polir en utilisant une bouillie de polissage contenant au moins un type de grains abrasifs sélectionné parmi le groupe constitué du diamant, de l'oxyde d'aluminium, et de l'oxyde de cérium avec une taille de particules moyenne inférieure ou égale à 15 nm.
(JA) 【課題】本発明は、今後求められる更なる高記録容量化、高精度化にも充分に対応できるRaの微小な情報記録媒体用ガラス基板の製造方法を提供する。 【解決手段】ガラス基板の主表面を研磨する粗研磨工程により、原子間力顕微鏡を用いて1μm×1μm角で256×256ピクセルの解像度で測定した場合の前記主表面における算術平均粗さRaが0.2nm以下のガラス基板を製造し、その後、平均粒子径が15nm以下のダイヤモンド、酸化アルミニウム及び酸化セリウムなる群から選ばれる少なくとも1種の砥粒を含む研磨スラリーを用いて研磨をする仕上げ研磨工程により、ガラス基板を研磨する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)