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1. (WO2017037918) MOLDING MOLD, MOLDING MOLD MANUFACTURING METHOD, AND REPLICA MANUFACTURING METHOD

Pub. No.:    WO/2017/037918    International Application No.:    PCT/JP2015/075073
Publication Date: Fri Mar 10 00:59:59 CET 2017 International Filing Date: Fri Sep 04 01:59:59 CEST 2015
IPC: B29C 33/38
B29C 33/42
G02B 1/118
H01L 21/302
H01L 21/3065
Applicants: NALUX CO., LTD.
ナルックス株式会社
Inventors: YAMAMOTO, Kazuya
山本 和也
YAMAMOTO, Takeshi
山本 剛司
Title: MOLDING MOLD, MOLDING MOLD MANUFACTURING METHOD, AND REPLICA MANUFACTURING METHOD
Abstract:
The purpose of the present invention is to provide a molding mold manufacturing method by which the shape of a fine uneven structure of a wide-region pitch can be sufficiently adjusted to a satisfactory degree. Provided is a molding mold manufacturing method which includes a plasma dry-etching process in which a semiconductor or a metal base material which react to sulfur hexafluoride is disposed in a reactive ion etching device, and a mixed gas of sulfur hexafluoride and oxygen is introduced into the etching device. In the plasma dry-etching process, an oxide is scattered onto the surface of the base material, etching is caused to progress on the surface of the base material using sulfur hexafluoride and with the oxide serving as an etching-prevention mask, and as a result thereof, a fine uneven structure is formed on the surface of the base material. Thereafter, an ion beam is projected onto the fine uneven structure in order to adjust the shape of the projections of the fine uneven structure.