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1. (WO2017037367) PHOTOPOLYMERISABLE COMPOSITION COMPRISING A (METH)ACRYLIC MATRIX AND (METH)ACRYLIC BLOCK COPOLYMERS
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Pub. No.: WO/2017/037367 International Application No.: PCT/FR2016/052125
Publication Date: 09.03.2017 International Filing Date: 26.08.2016
IPC:
C08F 287/00 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
287
Macromolecular compounds obtained by polymerising monomers on to block polymers
Applicants:
ARKEMA FRANCE [FR/FR]; 420 rue d'Estienne d'Orves 92700 Colombes, FR
Inventors:
INOUBLI, Raber; FR
BOURROUSSE, Charles; FR
Agent:
LE CROM, Christophe; FR
Priority Data:
15 5820704.09.2015FR
Title (EN) PHOTOPOLYMERISABLE COMPOSITION COMPRISING A (METH)ACRYLIC MATRIX AND (METH)ACRYLIC BLOCK COPOLYMERS
(FR) COMPOSITION PHOTO-POLYMÉRISABLE À BASE D'UNE MATRICE (MÉTH)ACRYLIQUE ET DE COPOLYMÈRES À BLOCS (MÉTH)ACRYLIQUES
Abstract:
(EN) The invention relates to a photopolymerisable composition comprising a (meth)acrylic matrix, essentially characterised in that it further comprises a (meth)acrylic block copolymer or a mixture of (meth)acrylic block copolymers, solubilised in said (meth)acrylic matrix, and one or more photoinitiator(s).
(FR) L'invention concerne une composition photo-polymerisable à base d'une matrice (méth)acrylique, principalement caractérisée en ce qu'elle comprend en outre un copolymère à blocs (méth)acrylique, ou un mélange de copolymères à blocs (méth)acryliques, solubilisé(s) dans ladite matrice(méth)acrylique et un ou plusieurs photoamorceur(s).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)