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1. (WO2017037339) APPARATUS FOR PROCESSING A SURFACE OF SUBSTRATE AND METHOD OPERATING THE APPARATUS

Pub. No.:    WO/2017/037339    International Application No.:    PCT/FI2016/050593
Publication Date: Fri Mar 10 00:59:59 CET 2017 International Filing Date: Wed Aug 31 01:59:59 CEST 2016
IPC: C23C 16/52
C23C 16/455
C23C 16/54
Applicants: BENEQ OY
Inventors: KETO, Leif
SOININEN, Pekka
SÖDERLUND, Mikko
Title: APPARATUS FOR PROCESSING A SURFACE OF SUBSTRATE AND METHOD OPERATING THE APPARATUS
Abstract:
The invention relates to an apparatus for processing a surface of the substrate (1, 101) by atomic layer deposition and to a method for operating the apparatus. The apparatus comprising a deposition chamber (4) and one or more lead-through connections (13, 15, 16) provided between one or more side chambers (12, 42, 52, 112) and the deposition chamber (4). The one or more lead through connections (13, 15, 16) comprises one or more lead- through chambers (18) and a secondary pressure device (20) operatively connected to the one or more lead-through chambers (18).