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1. (WO2017036360) RELATIVE POSITION MEASUREMENT BASED ALIGNMENT SYSTEM, DOUBLE WORKPIECE STAGE SYSTEM AND MEASUREMENT SYSTEM

Pub. No.:    WO/2017/036360    International Application No.:    PCT/CN2016/096931
Publication Date: Fri Mar 10 00:59:59 CET 2017 International Filing Date: Sat Aug 27 01:59:59 CEST 2016
IPC: G03F 9/00
Applicants: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
上海微电子装备(集团)股份有限公司
Inventors: LI, Yunfeng
李运峰
Title: RELATIVE POSITION MEASUREMENT BASED ALIGNMENT SYSTEM, DOUBLE WORKPIECE STAGE SYSTEM AND MEASUREMENT SYSTEM
Abstract:
An alignment system, a double workpiece stage system and a measurement system. The alignment system comprises: a main frame (5, 301), a first workpiece stage (1, 305), an alignment sensor (4, 302), a position collection module (7, 308) and a signal processing apparatus (6, 303). The position collection module (7, 308) collects position data acquired from the first workpiece stage (1, 305) and a reflector (8, 304) at the same time, wherein the reflector (8, 304) is located on the alignment sensor (4, 302), that is, position data of the alignment sensor (4, 302) and the first workpiece stage (1, 305) is collected at the same time; and the relative position of the first workpiece stage (1, 305), when having no vibration with respect to the alignment sensor (4, 302), can be obtained by means of processing, that is, when a relative amplitude of the alignment sensor (4, 302) is zero, an alignment position of an alignment mark can be obtained, thereby avoiding the influence of the vibration on the alignment sensor (4, 302), and improving the repeated alignment accuracy.