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1. (WO2017035909) PHOTOMASK FOR OPTICAL ALIGNMENT AND OPTICAL ALIGNMENT METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2017/035909 International Application No.: PCT/CN2015/091721
Publication Date: 09.03.2017 International Filing Date: 12.10.2015
IPC:
G03F 1/54 (2012.01) ,G02F 1/1337 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
54
Absorbers, e.g. opaque materials
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1337
Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
深圳市华星光电技术有限公司 SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO.,LTD. [CN/CN]; 中国广东省深圳市 光明新区塘明大道9-2号 No. 9-2, Tangming Road, Guangming District of Shenzhen, Guangdong 518132, CN
Inventors:
韩丙 HAN, Bing; CN
Agent:
深圳市德力知识产权代理事务所 COMIPS INTELLECTUAL PROPERTY OFFICE; 中国广东省深圳市 福田区上步中路深勘大厦15E Room 15E, Shenkan Building, Shangbu Zhong Road, Futian District Shenzhen, Guangdong 518028, CN
Priority Data:
201510553278.601.09.2015CN
Title (EN) PHOTOMASK FOR OPTICAL ALIGNMENT AND OPTICAL ALIGNMENT METHOD
(FR) PHOTOMASQUE POUR L'ALIGNEMENT OPTIQUE ET PROCÉDÉ D'ALIGNEMENT OPTIQUE
(ZH) 用于光配向的光罩及光配向方法
Abstract:
(EN) A photomask(2) for optical alignment and an optical alignment method. By aligning the tail ends of first light-transmission patterns(313) which form a first photomask figure(3), and aligning the front ends of second light-transmission patterns(413) which form a second photomask figure(4) in the photomask(2), the unexposed or underexposed areas do not exist at the tail ends of first substrate units(11) and the front ends of second substrate units(12) during the process of optical alignment, thereby the problem existed in the traditional optical alignment manufacture process, that the brightness of a display is not uniform due to the existing unexposed or underexposed areas, is solved, meanwhile, the reduction of the distance between the first substrate units(11) and the second substrate units(12) on a substrate is facilitated, thereby the utilization rate of the substrate is improved.
(FR) L'invention concerne un photomasque (2) pour l'alignement optique et un procédé d'alignement optique. En alignant les extrémités de queue de premiers motifs de transmission de lumière (313) qui forment une première figure de photomasque (3), et en alignant les extrémités avant de deuxièmes motifs de transmission de lumière (413) qui forment une deuxième figure de photomasque (4) dans le photomasque (2), les zones non exposées ou sous-exposées n'existent pas au niveau des extrémités de queue de premières unités de substrat (11) et des extrémités avant de deuxièmes unités de substrat (12) pendant le processus d'alignement optique, ainsi le problème existant dans le processus classique de fabrication d'alignement optique, selon lequel la luminosité d'un affichage n'est pas uniforme à cause des zones non exposées ou sous-exposées existantes, est résolu, simultanément, la réduction de la distance entre les premières unités de substrat (11) et les deuxièmes unités de substrat (12) sur un substrat est facilitée, ainsi le taux d'utilisation du substrat est amélioré.
(ZH) 一种用于光配向的光罩(2)及光配向方法,通过设置光罩(2)中组成第一光罩图形(3)的第一透光图案(313)的末端对齐,组成第二光罩图形(4)的第二透光图案(413)的前端对齐,使得在光配向过程中,第一基板单元(11)的末端和第二基板单元(12)的前端不存在未曝光或者曝光不足的区域,解决了传统的光配向制程中因存在未曝光或者曝光不足的区域导致的显示器亮度不均匀等问题,同时有利于缩小基板上第一基板单元(11)与第二基板单元(12)之间的距离,从而提高基板利用率。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)