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1. (WO2017034814) SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2017/034814 International Application No.: PCT/US2016/046541
Publication Date: 02.03.2017 International Filing Date: 11.08.2016
IPC:
C07D 221/14 (2006.01) ,C07D 401/10 (2006.01) ,G03F 7/004 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
221
Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/-C07D219/187
02
condensed with carbocyclic rings or ring systems
04
Ortho- or peri-condensed ring systems
06
Ring systems of three rings
14
Aza-phenalenes, e.g. 1,8-naphthalimide
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
401
Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
02
containing two hetero rings
10
linked by a carbon chain containing aromatic rings
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
Applicants:
HERAEUS PRECIOUS METALS NORTH AMERICA DAYCHEM LLC [US/US]; 970 Industrial Park Drive Vandalia, OH 45377, US
Inventors:
ZHANG, Yongqiang; US
CAMPO, Darin; US
SHARMA, Ram, B.; US
KUNZ, Martin; DE
Agent:
ROSSI, Joseph, D.; US
COCCA, Brian, A.; US
CASEY, Kevin, R.; US
O'DONOGHUE, Elizbeth, M.; US
ANDERSON, Kevin, B.; US
Priority Data:
62/208,07721.08.2015US
Title (EN) SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS
(FR) COMPOSÉS DÉRIVÉ D'ACIDE SULFONIQUE EN TANT QUE GÉNÉRATEURS DE PHOTOACIDES DANS DES APPLICATIONS DE RÉSINE PHOTOSENSIBLE
Abstract:
(EN) Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
(FR) L'invention concerne de nouveaux composés générateurs de photoacides. L'invention concerne également des compositions qui comprennent ces nouveaux composés générateurs de photoacides. La présente invention concerne en outre des procédés de production et d'utilisation des composés générateurs de photoacides et des compositions de l'invention. Ces composés et compositions sont utiles comme composants photoactifs dans des compositions de résine photosensible chimiquement amplifiées pour diverses applications de microfabrication.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)