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|1. (WO2017034687) METHODS TO IMPROVE IN-FILM PARTICLE PERFORMANCE OF AMORPHOUS BORN-CARBON HARDMASK PROCESS IN PECVD SYSTEM|
|Applicants:||APPLIED MATERIALS, INC.
LEE, Kwangduk Douglas
KHAJA, Abdul Aziz
BANSAL, Amit Kumar
KIM, Bok Hoen
KULSHRESHTHA, Prashant Kumar
|Title:||METHODS TO IMPROVE IN-FILM PARTICLE PERFORMANCE OF AMORPHOUS BORN-CARBON HARDMASK PROCESS IN PECVD SYSTEM|
Implementations of the present disclosure generally relate to the fabrication of integrated circuits. More particularly, the implementations described herein provide techniques for deposition of boron-containing amorphous carbon films on a substrate with reduced particle contamination. In one implementation, the method comprises flowing a hydrocarbon-containing gas mixture into a processing volume having a substrate positioned therein, flowing a boron-containing gas mixture into the processing volume, stabilizing the pressure in the processing volume for a predefined RF-on delay time period, generating an RF plasma in the processing volume after the predefined RF-on delay time period expires to deposit a boron-containing amorphous film on the substrate, exposing the processing volume of the process chamber to a dry cleaning process and depositing an amorphous boron season layer over at least one surface in the processing volume of the process chamber.