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1. (WO2017034228) QUANTUM-DOT SURFACE-PROCESSING METHOD FOR IMPARTING CHEMICAL RESISTANCE, AND QUANTUM DOTS PRODUCED THEREBY
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Pub. No.: WO/2017/034228 International Application No.: PCT/KR2016/009160
Publication Date: 02.03.2017 International Filing Date: 19.08.2016
IPC:
C09K 11/02 (2006.01) ,C09K 11/08 (2006.01)
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
11
Luminescent, e.g. electroluminescent, chemiluminescent, materials
02
Use of particular materials as binders, particle coatings or suspension media therefor
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
11
Luminescent, e.g. electroluminescent, chemiluminescent, materials
08
containing inorganic luminescent materials
Applicants:
주식회사 두하누리 DOOHANURI CO.,LTD. [KR/KR]; 서울시 서초구 매헌로 31-3,202 202, 31-3, Maeheon-ro Seocho-gu Seoul 06772, KR
Inventors:
김재일 KIM, Jaeil; KR
임태윤 IM, Taeyun; KR
Agent:
신경호 SHIN, Kyoungho; KR
Priority Data:
10-2015-011761521.08.2015KR
Title (EN) QUANTUM-DOT SURFACE-PROCESSING METHOD FOR IMPARTING CHEMICAL RESISTANCE, AND QUANTUM DOTS PRODUCED THEREBY
(FR) PROCÉDÉ DE TRAITEMENT DE SURFACE DES BOÎTES QUANTIQUES POUR LEUR CONFÉRER UNE RÉSISTANCE CHIMIQUE, ET BOÎTES QUANTIQUES AINSI PRODUITES
(KO) 양자점의 내화학성 부여 표면처리 방법 및 이에 의해 제조되는 양자점
Abstract:
(EN) The present invention relates to: a quantum-dot surface-processing method for imparting chemical resistance by subjecting metal ions present on the surface of quantum dots to a cation exchange reaction and thereby subjecting same to place exchange with metal ions of another type which were previously present on the outside of the quantum dots; and quantum dots produced by means of the method. The present invention is devised in such a way that an inorganic shell coating is constituted on the quantum dot surface in straightforward yet also stable fashion, and in such a way that external environmental effects are not experienced, and, as a result, in such a way that the invention has outstanding chemical resistance and heat resistance, and in such a way that an inorganic layer, that has the nature of a buffer formed on the outermost shell of the quantum dot, can have a thickness that does not affect the light-emitting properties.
(FR) La présente invention concerne : un procédé de traitement de surface de boîtes quantiques pour leur conférer une résistance chimique par soumission des ions métalliques présents sur la surface des boîtes quantiques à une réaction d'échange de cations et les soumettre ainsi à un échange d'emplacement avec des ions métalliques d'un autre type qui étaient précédemment présents à l'extérieur des boîtes quantiques ; et des boîtes quantiques produites par ledit procédé. La présente invention est conçue de façon qu'un revêtement de coque inorganique soit constitué sur la surface des boîtes quantiques de manière simple mais également stable, et de façon que les effets de l'environnement extérieur ne soient pas subis, et, par conséquent, que l'invention présente une excellente résistance chimique et résistance à la chaleur, et qu'une couche inorganique, ayant la nature d'un tampon, formée sur la coque la plus extérieure de la boîte quantique, puisse avoir une épaisseur qui n'affecte pas les propriétés électroluminescentes.
(KO) 본 발명은 양자점의 표면에 존재하는 금속이온을 양이온 교환 반응(cation exchange reaction)에 의해, 상기 양자점의 외부에 존재하던 이종의 금속이온으로 자리 교환되도록 하는, 양자점의 내화학성 부여 표면처리 방법 및 이에 의해 제조되는 양자점에 관한 것이다. 본 발명에 따르면, 양자점 표면에 대해서 간단하면서도 안정적으로 무기 쉘코팅(inorganic shell coating)이 이루어지도록 하여, 외부 환경의 영향을 받지 않도록 하고, 이로 인해 뛰어난 내화학성 및 내열성을 가지도록 하며, 양자점 최외각에 형성되는 버퍼(buffer) 성격의 무기막(inorganic layer)이 발광성에 영향을 미치지 않는 두께를 가지도록 할 수 있다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)