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1. (WO2017034213) PLASMA CLEANING RING FOR IN-SITU CLEANING, PLASMA PROCESSING APPARATUS INCLUDING A PLASMA RING, PLASMA PROCESSING SYSTEM INCLUDING THE PLASMA CLEANING RING AND PLASMA PROCESSING METHOD USING THE PLASMA CLEANING RING

Pub. No.:    WO/2017/034213    International Application No.:    PCT/KR2016/009074
Publication Date: Fri Mar 03 00:59:59 CET 2017 International Filing Date: Fri Aug 19 01:59:59 CEST 2016
IPC: H01L 21/02
H01L 21/683
H05H 1/46
H01L 21/67
Applicants: NP HOLIDINGS CO., LTD.
Inventors: CHOI, Dai Kyu
Title: PLASMA CLEANING RING FOR IN-SITU CLEANING, PLASMA PROCESSING APPARATUS INCLUDING A PLASMA RING, PLASMA PROCESSING SYSTEM INCLUDING THE PLASMA CLEANING RING AND PLASMA PROCESSING METHOD USING THE PLASMA CLEANING RING
Abstract:
The substrate can be selectively transferred by a vacuum or edge grip method according to the process characteristics, using a single substrate transfer robot equipped in the front end module. Additionally, after the process, the substrate can be loaded using the buffer chamber, for the cooling process and transfer of the substrate.