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1. (WO2017034057) SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD

Pub. No.:    WO/2017/034057    International Application No.:    PCT/KR2015/009001
Publication Date: Fri Mar 03 00:59:59 CET 2017 International Filing Date: Fri Aug 28 01:59:59 CEST 2015
IPC: H01L 21/302
H01L 21/66
Applicants: ZEUS CO., LTD.
주식회사 제우스
Inventors: JUNG, Kwang Il
정광일
LEE, Byeong Su
이병수
RYU, Joo Hyung
유주형
Title: SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD
Abstract:
A substrate treatment device and a substrate treatment method are disclosed. The disclosed substrate treatment device comprises: an emissivity setting unit for inputting the emissivity of a liquid chemical coming in contact with a substrate, or the emissivity on an interface at which the substrate and the liquid chemical come in contact with each other; a radiant energy input unit for inputting the radiant energy emitted from the liquid chemical or the interface; and a calculation unit for calculating a calculation temperature of the liquid chemical or the interface on the basis of the emissivity and the radiant energy.