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1. (WO2017033987) HYDROGENATED BLOCK COPOLYMER, POLYPROPYLENE-BASED RESIN COMPOSITION USING SAME, AND MOLDED BODY THEREOF
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Pub. No.: WO/2017/033987 International Application No.: PCT/JP2016/074718
Publication Date: 02.03.2017 International Filing Date: 24.08.2016
IPC:
C08F 297/04 (2006.01) ,C08F 8/04 (2006.01) ,C08L 23/10 (2006.01) ,C08L 53/02 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
297
Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
02
using a catalyst of the anionic type
04
polymerising vinyl aromatic monomers and conjugated dienes
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
8
Chemical modification by after-treatment
04
Reduction, e.g. hydrogenation
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
23
Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
02
not modified by chemical after-treatment
10
Homopolymers or copolymers of propene
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
53
Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
02
of vinyl aromatic monomers and conjugated dienes
Applicants:
旭化成株式会社 ASAHI KASEI KABUSHIKI KAISHA [JP/JP]; 東京都千代田区神田神保町一丁目105番地 1-105, Kanda Jinbocho, Chiyoda-ku, Tokyo 1018101, JP
Inventors:
市野 洋之 ICHINO, Hiroyuki; JP
草ノ瀬 康弘 KUSANOSE, Yasuhiro; JP
山本 政嗣 YAMAMOTO, Masashi; JP
Agent:
稲葉 良幸 INABA, Yoshiyuki; JP
大貫 敏史 ONUKI, Toshifumi; JP
内藤 和彦 NAITO, Kazuhiko; JP
Priority Data:
2015-16517224.08.2015JP
Title (EN) HYDROGENATED BLOCK COPOLYMER, POLYPROPYLENE-BASED RESIN COMPOSITION USING SAME, AND MOLDED BODY THEREOF
(FR) COPOLYMÈRE SÉQUENCÉ HYDROGÉNÉ, COMPOSITION DE RÉSINE À BASE DE POLYPROPYLÈNE METTANT EN ŒUVRE CELUI-CI, ET CORPS MOULÉ
(JA) 水素化ブロック共重合体並びにこれを用いたポリプロピレン系樹脂組成物及びその成型体
Abstract:
(EN) The present invention provides a hydrogenated block copolymer having in a molecule a polymer block (S) having as a main body a vinyl aromatic compound unit and a polymer block (B) having as a main body a conjugated diene compound unit, wherein: in the hydrogenated block copolymer, the content of the polymer block (S) is 5-20 mass%, and the content of the polymer block (B) is 80-95 mass%; the polymer block (B) includes a polymer block (B1) and a polymer block (B2); the vinyl bond amount of the polymer block (B1) before hydrogenation is 30-60 mol% and the vinyl bond amount of the polymer block (B2) before hydrogenation is over 60 mol% and up to 100 mol%; in the hydrogenated block copolymer, the content of the polymer block (B1) is 5-60 mass% and the content of the polymer block (B2) is 30-85 mass%; in the hydrogenated block copolymer, the content of the structure represented by formula (1) is 40-100 mass%, and the hydrogenation rate of the hydrogenated block copolymer is 70 mol% or greater. Formula 1: (S-B) (In formula (1), S refers to the polymer block (S), and B refers to the polymer block (B)).
(FR) L’invention fournit un copolymère séquencé hydrogéné qui possède, dans une molécule, une séquence polymère (S) essentiellement constituée d’une unité composé aromatique de vinyle, et une séquence polymère (B) essentiellement constituée d’une unité composé de diène conjugué. La teneur en séquence polymère (S) et en en séquence polymère (B), dans ledit copolymère séquencé hydrogéné, sont respectivement comprises entre 5 et 20% en masse et 80 et 95% en masse. Ladite séquence polymère (B) contient une séquence polymère (B1) et une séquence polymère (B2). La quantité de liaison vinyle avant hydrogénation de ladite séquence polymère (B1), est comprise entre 30 et 60% en moles. La quantité de liaison vinyle avant hydrogénation de ladite séquence polymère (B2) est comprise entre 60 et 100% en masse. La teneur en séquence polymère (B1), et la teneur en séquence polymère (B2), dans ledit copolymère séquencé hydrogéné, sont respectivement comprises entre 5 et 60% en masse et 30 et 85% en masse. La teneur en structure représentée par la formule (1), dans ledit copolymère séquencé hydrogéné, est comprise entre 40 et 100% en masse. Le taux d’hydrogénation dudit copolymère séquencé hydrogéné est supérieur ou égal à 70% en moles. (S-B) ・・・formule(1)(Dans la formule (1), S signifie séquence polymère (S), et B signifie séquence polymère (B).)
(JA) 本発明は、分子中に、ビニル芳香族化合物単位を主体とする重合体ブロック(S)と、共役ジエン化合物単位を主体とする重合体ブロック(B)とを有する水素化ブロック共重合体であって、前記水素化ブロック共重合体中、前記重合体ブロック(S)の含有量が5~20質量%であり、前記重合体ブロック(B)の含有量が80~95質量%であり、前記重合体ブロック(B)は、重合体ブロック(B1)及び重合体ブロック(B2)を含み、前記重合体ブロック(B1)の水素化前のビニル結合量が30~60モル%であり、前記重合体ブロック(B2)の水素化前のビニル結合量が60超~100モル%であり、前記水素化ブロック共重合体中、前記重合体ブロック(B1)の含有量は5~60質量%であり、前記重合体ブロック(B2)の含有量は30~85質量%であり、前記水素化ブロック共重合体中、下記式(1)で表される構造の含有量が40~100質量%であり、前記水素化ブロック共重合体の水素化率が70モル%以上である、水素化ブロック共重合体を提供する。 (S-B) ・・・式(1) (式(1)中、Sは重合体ブロック(S)を意味し、Bは重合体ブロック(B)を意味する。)
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)