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1. (WO2017033984) PHOTOSENSITIVE COMPOSITION, IMAGE FORMING METHOD, FILM FORMING METHOD, RESIN, IMAGE AND FILM
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Pub. No.: WO/2017/033984 International Application No.: PCT/JP2016/074706
Publication Date: 02.03.2017 International Filing Date: 24.08.2016
IPC:
C08F 265/06 (2006.01) ,B41J 2/01 (2006.01) ,B41M 5/00 (2006.01) ,C08F 2/44 (2006.01) ,C08F 220/34 (2006.01) ,C09D 11/30 (2014.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
265
Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/181
04
on to polymers of esters
06
Polymerisation of acrylate or methacrylate esters on to polymers thereof
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
J
TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
2
Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
005
characterised by bringing liquid or particles selectively into contact with a printing material
01
Ink jet
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
M
PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
5
Duplicating or marking methods; Sheet materials for use therein
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
44
Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
34
Esters containing nitrogen
[IPC code unknown for C09D 11/30]
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
佐藤 憲晃 SATO, Noriaki; JP
鈴木 昭太 SUZUKI, Shota; JP
澤村 泰弘 SAWAMURA, Yasuhiro; JP
スレーター ショーン SLATER, Sean; JP
Agent:
中島 淳 NAKAJIMA, Jun; JP
加藤 和詳 KATO, Kazuyoshi; JP
福田 浩志 FUKUDA, Koji; JP
Priority Data:
2015-16797427.08.2015JP
Title (EN) PHOTOSENSITIVE COMPOSITION, IMAGE FORMING METHOD, FILM FORMING METHOD, RESIN, IMAGE AND FILM
(FR) COMPOSITION PHOTOSENSIBLE, PROCÉDÉ DE FORMATION D'IMAGE, PROCÉDÉ DE FORMATION DE FILM, RÉSINE, IMAGE ET FILM
(JA) 感光性組成物、画像形成方法、膜形成方法、樹脂、画像、及び膜
Abstract:
(EN) A photosensitive composition which contains a radically polymerizable monomer and a resin containing a structural unit A represented by formula (1) or formula (2) and a structural unit B represented by formula (3), formula (4) or formula (5); an image forming method; a film forming method; a resin; an image; and a film. In the formulae, each of R11, R21, R31, R41 and R51 represents H or a hydrocarbon group; each of R12-R14 and R22-R24 represents a hydrocarbon group, H, an OH group or the like; each of R42, R43, R52 and R53 represents H, a hydrocarbon group or the like; each of L1-L3 represents a single bond or a linking group; X1 represents -O- or -NR15-; X2 represents -O- or -NR25-; each of R15 and R25 represents H or a hydrocarbon group; and Cy1 represents a hydrocarbon group containing a cyclic structure that may contain O.
(FR) L'invention concerne une composition photosensible qui contient un monomère polymérisable par voie radicalaire et une résine contenant un motif structural A représenté par la formule (1) ou la formule (2) et un motif structural B représenté par la formule (3), la formule (4) ou la formule (5); un procédé de formation d'image; un procédé de formation de film; une résine; une image; et un film. Dans les formules, chacun parmi R11, R21, R31, R41 et R51 représente H ou un groupe hydrocarboné; chacun parmi R12-R14 et R22-R24 représente un groupe hydrocarboné, H, un groupe OH ou analogue; chacun parmi R42, R43, R52 et R53 représente H, un groupe hydrocarboné ou analogue; chacun parmi L1-L3 représente une simple liaison ou un groupe de liaison; X1 représente -O- ou -NR15-; X2 représente -O- ou -NR25-; chacun parmi R15 et R25 représente H ou un groupe hydrocarboné; et Cy1 représente un groupe hydrocarboné contenant une structure cyclique qui peut contenir O.
(JA) 式(1)又は式(2)で表される構造単位A、及び、式(3)、式(4)又は式(5)で表される構造単位Bを含む樹脂と、ラジカル重合性モノマーと、を含有する感光性組成物、並びに、画像形成方法、膜形成方法、樹脂、画像、及び膜。R11、R21、R31、R41、及びR51はH又は炭化水素基を、R12~R14及びR22~R24は炭化水素基、H又はOH基等を、R42、R43、R52、及びR53はH又は炭化水素基等を、L~Lは単結合又は連結基を、Xは-O-又は-NR15-を、Xは-O-又は-NR25-を、R15及びR25はH又は炭化水素基を、CyはOを含んでもよい環状構造を含む炭化水素基をそれぞれ表す。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)