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1. (WO2017033943) LITHOGRAPHY MATERIAL AND MANUFACTURING METHOD THEREFOR, LITHOGRAPHY COMPOSITION, PATTERN FORMING METHOD, COMPOUND, RESIN, AND REFINING METHOD FOR COMPOUND AND RESIN
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Pub. No.: WO/2017/033943 International Application No.: PCT/JP2016/074563
Publication Date: 02.03.2017 International Filing Date: 23.08.2016
IPC:
G03F 7/004 (2006.01) ,C07C 395/00 (2006.01) ,G03F 7/038 (2006.01) ,G03F 7/039 (2006.01) ,G03F 7/20 (2006.01)
[IPC code unknown for G03F 7/04][IPC code unknown for C07C 395][IPC code unknown for G03F 7/038][IPC code unknown for G03F 7/039][IPC code unknown for G03F 7/20]
Applicants:
学校法人関西大学 A SCHOOL CORPORATION KANSAI UNIVERSITY [JP/JP]; 大阪府吹田市山手町3丁目3番35号 3-35, Yamate-cho 3-chome, Suita-shi, Osaka 5648680, JP
三菱瓦斯化学株式会社 MITSUBISHI GAS CHEMICAL COMPANY, INC. [JP/JP]; 東京都千代田区丸の内二丁目5番2号 5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1008324, JP
Inventors:
工藤 宏人 KUDO, Hiroto; JP
越後 雅敏 ECHIGO, Masatoshi; JP
樋田 匠 TOIDA, Takumi; JP
佐藤 隆 SATO, Takashi; JP
Agent:
稲葉 良幸 INABA, Yoshiyuki; JP
大貫 敏史 ONUKI, Toshifumi; JP
内藤 和彦 NAITO, Kazuhiko; JP
Priority Data:
2015-16530524.08.2015JP
Title (EN) LITHOGRAPHY MATERIAL AND MANUFACTURING METHOD THEREFOR, LITHOGRAPHY COMPOSITION, PATTERN FORMING METHOD, COMPOUND, RESIN, AND REFINING METHOD FOR COMPOUND AND RESIN
(FR) MATÉRIAU POUR LITHOGRAPHIE AINSI QUE PROCÉDÉ DE FABRICATION DE CELUI-CI, COMPOSITION POUR LITHOGRAPHIE, PROCÉDÉ DE FORMATION DE MOTIF, COMPOSÉ, RÉSINE, ET PROCÉDÉ DE PURIFICATION DE CES COMPOSÉ ET RÉSINE
(JA) リソグラフィー用材料及びその製造方法、リソグラフィー用組成物、パターン形成方法、並びに、化合物、樹脂、及びこれらの精製方法
Abstract:
(EN) A lithography material that contains a tellurium-containing compound or a tellurium-containing resin, a manufacturing method for said material, a lithography composition, a pattern forming method, a compound, a resin, and a refining method for the compound and the resin.
(FR) L'invention concerne un matériau pour lithographie ainsi qu'un procédé de fabrication de ce matériau, une composition pour lithographie, un procédé de formation de motif, un composé, une résine, et un procédé de purification de ces composé et résine. Ledit matériau pour lithographie comprend le composé comprenant un tellure, ou la résine comprenant un tellure.
(JA) テルルを含有する化合物又はテルルを含有する樹脂を含有するリソグラフィー用材料及びその製造方法、リソグラフィー用組成物、パターン形成方法、並びに、化合物、樹脂、及びこれらの精製方法。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)