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1. (WO2017033936) NON-MAGNETIC AMORPHOUS ALLOY, AND SPUTTERING TARGET MATERIAL AND MAGNETIC RECORDING MEDIUM USING SAID ALLOY

Pub. No.:    WO/2017/033936    International Application No.:    PCT/JP2016/074533
Publication Date: Fri Mar 03 00:59:59 CET 2017 International Filing Date: Wed Aug 24 01:59:59 CEST 2016
IPC: G11B 5/738
C23C 14/34
G11B 5/851
Applicants: SANYO SPECIAL STEEL CO., LTD.
山陽特殊製鋼株式会社
Inventors: HASEGAWA Hiroyuki
長谷川 浩之
SHINMURA Yumeki
新村 夢樹
Title: NON-MAGNETIC AMORPHOUS ALLOY, AND SPUTTERING TARGET MATERIAL AND MAGNETIC RECORDING MEDIUM USING SAID ALLOY
Abstract:
The purpose of the present invention is to provide: a non-magnetic amorphous Co alloy that can prevent the occurrence of crystallization during high-temperature treatment (for example, heat treatment at approximately 400–500°C during magnetic layer formation on a heat-assisted magnetic recording medium); and a sputtering target material and a magnetic recording medium that use the Co alloy. In order to fulfill this purpose, the present invention provides a non-magnetic amorphous alloy that includes: 0 at% to 2 at% inclusive of Fe; 5 at% to 20 at% inclusive of an A group element comprising one or more elements selected from Ti, Zr, and Hf; 16 at% to 50 at% inclusive of a B group element comprising two or more elements selected from Cr, Mo, and W; 0 at% to 25 at% inclusive of a C group element comprising one or more elements selected from V, Nb, and Ta; 0 at% to 20 at% inclusive of a D group element comprising one or more elements selected from Si, Ge, P, B, and C; and a remainder which comprises Co and unavoidable impurities. The sum of the content of the A group element and the content of the B group element is more than 35 at% to 70 at%.