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1. (WO2017033871) BLOCK COPOLYMER
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Pub. No.: WO/2017/033871 International Application No.: PCT/JP2016/074288
Publication Date: 02.03.2017 International Filing Date: 19.08.2016
IPC:
C08F 293/00 (2006.01) ,C08F 8/48 (2006.01) ,C08F 220/18 (2006.01) ,C08J 5/18 (2006.01) ,G02B 5/30 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
293
Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
8
Chemical modification by after-treatment
48
Isomerisation; Cyclisation
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
12
of monohydric alcohols or phenols
16
of phenols or of alcohols containing two or more carbon atoms
18
with acrylic or methacrylic acids
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
5
Manufacture of articles or shaped materials containing macromolecular substances
18
Manufacture of films or sheets
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
30
Polarising elements
Applicants:
株式会社日本触媒 NIPPON SHOKUBAI CO., LTD. [JP/JP]; 大阪府大阪市中央区高麗橋4丁目1番1号 1-1, Koraibashi 4-chome, Chuo-ku, Osaka-shi, Osaka 5410043, JP
Inventors:
中西 秀高 NAKANISHI, Hidetaka; JP
Agent:
岩谷 龍 IWATANI, Ryo; JP
Priority Data:
2015-16388321.08.2015JP
Title (EN) BLOCK COPOLYMER
(FR) COPOLYMÈRE SÉQUENCÉ
(JA) ブロック共重合体
Abstract:
(EN) Provided are a novel block copolymer having a (meth)acrylic acid ester as a polymer component, and a film composed of the block copolymer. The novel block copolymer is a block copolymer containing a (meth)acrylic acid ester as a polymer component and having a ring structure on the main chain.
(FR) L'invention concerne un nouveau copolymère séquencé contenant un ester d'acide (méth)acrylique à titre de composant polymère, et un film composé dudit copolymère séquencé. Le nouveau copolymère séquencé est un copolymère séquencé contenant un ester d'acide (méth)acrylique à titre de composant polymère et ayant une structure de cycle sur sa chaîne principale.
(JA) (メタ)アクリル酸エステルを重合成分とする新規なブロック共重合体及びこのブロック共重合体で構成されたフィルムを提供する。新規なブロック共重合体を、(メタ)アクリル酸エステルを重合成分として含み、主鎖に環構造を有するブロック共重合体とする。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)