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1. (WO2017033814) ORGANOSILICON COMPOUND, POLYMER COMPOUND, INORGANIC MATERIAL AND RESIN COMPOSITION
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Pub. No.: WO/2017/033814 International Application No.: PCT/JP2016/074029
Publication Date: 02.03.2017 International Filing Date: 17.08.2016
IPC:
C07F 7/18 (2006.01) ,C08F 30/08 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7
Compounds containing elements of the 4th Group of the Periodic System
02
Silicon compounds
08
Compounds having one or more C-Si linkages
18
Compounds having one or more C-Si linkages as well as one or more C-O-Si linkages
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
30
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
04
containing a metal
08
containing silicon
Applicants:
株式会社クラレ KURARAY CO., LTD. [JP/JP]; 岡山県倉敷市酒津1621番地 1621, Sakazu, Kurashiki-shi, Okayama 7100801, JP
Inventors:
佐藤 純子 SATO, Junko; JP
▲鶴▼田 拓大 TSURUTA, Takuo; JP
Priority Data:
2015-16733827.08.2015JP
Title (EN) ORGANOSILICON COMPOUND, POLYMER COMPOUND, INORGANIC MATERIAL AND RESIN COMPOSITION
(FR) COMPOSÉ D'ORGANOSILICIUM, COMPOSÉ POLYMÈRE, MATÉRIAU INORGANIQUE ET COMPOSITION DE RÉSINE
(JA) 有機ケイ素化合物、高分子化合物、無機材料および樹脂組成物
Abstract:
(EN) An organosilicon compound represented by general formula (I). (In the formula, each of R1-R3 independently represents a chlorine atom, a methoxy group or an ethoxy group; R4 represents an alkyl group having 1-10 carbon atoms; R5 represents an alkylene group having 1-10 carbon atoms; and R6 represents a hydrogen atom or a methyl group.)
(FR) L'invention concerne un composé d'organosilicium représenté par la formule générale (I). (Dans la formule, chacun des R1-R3 représente indépendamment un atome de chlore, un groupe méthoxy ou un groupe éthoxy ; R4 représente un groupe alkyle ayant de 1 à 10 atomes de carbone ; R5 représente un groupe alkylène ayant de 1 à 10 atomes de carbone ; et R6 représente un atome d'hydrogène ou un groupe méthyle).
(JA) 下記一般式(I)で表される有機ケイ素化合物。(式中、R~Rはそれぞれ独立して塩素原子、メトキシ基またはエトキシ基を表し、Rは炭素数1~10のアルキル基を表し、Rは炭素数1~10のアルキレン基を表し、Rは水素原子又はメチル基を表す。)
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)