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1. (WO2017033427) PATTERNING MATERIAL, PATTERNING METHOD AND PATTERNING DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2017/033427 International Application No.: PCT/JP2016/003681
Publication Date: 02.03.2017 International Filing Date: 09.08.2016
IPC:
C08F 2/44 (2006.01) ,B29C 67/00 (2017.01) ,B33Y 10/00 (2015.01) ,B33Y 30/00 (2015.01) ,B33Y 70/00 (2015.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
44
Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
67
Shaping techniques not covered by groups B29C39/-B29C65/93
[IPC code unknown for B33Y 10][IPC code unknown for B33Y 30][IPC code unknown for B33Y 70]
Applicants:
ナガセケムテックス株式会社 NAGASE CHEMTEX CORPORATION [JP/JP]; 大阪府大阪市西区新町1丁目1-17 1-17, Shinmachi 1-chome, Nishi-ku, Osaka-shi, Osaka 5508668, JP
Inventors:
渡部 功治 WATANABE, Koji; JP
Agent:
河崎 眞一 KAWASAKI, Shinichi; JP
Priority Data:
2015-16715726.08.2015JP
Title (EN) PATTERNING MATERIAL, PATTERNING METHOD AND PATTERNING DEVICE
(FR) MATÉRIAU, PROCÉDÉ ET DISPOSITIF DE FORMATION DE MOTIF
(JA) パターニング材料、パターニング方法、およびパターニング装置
Abstract:
(EN) Provided is a patterning material for three-dimensional stereolithography, which is capable of improving the curing speed and is also capable of suppressing shrinkage of a three-dimensional model. This patterning material for three-dimensional stereolithography contains a diallyl phthalate prepolymer, a photocurable monomer and a photopolymerization initiator, and is in a liquid state at room temperature. This patterning material is suitable for patterning by means of surface light exposure. The ratio of the diallyl phthalate prepolymer in the total amount of the diallyl phthalate prepolymer and the photocurable monomer is, for example, 5-40% by mass.
(FR) L'invention concerne un matériau de formation de motif pour stéréolithographie en trois dimensions, qui est capable d'améliorer la vitesse de durcissement et de supprimer le rétrécissement d'un modèle en trois dimensions. Ce matériau de formation de motif pour stéréolithographie en trois dimensions contient un prépolymère de phtalate de diallyle, un monomère pouvant durcir à la lumière et un initiateur de photo-polymérisation, et est à l'état liquide à température ambiante. Ce matériau de formation de motif est approprié pour la formation de motif au moyen d'une exposition à la lumière de la surface. Le rapport du prépolymère de phtalate de diallyle dans la quantité totale du prépolymère de phtalate de diallyle et du monomère pouvant durcir à la lumière est, par exemple, de 5 à 40 % en masse.
(JA) 硬化速度を向上できるとともに、三次元造形物の収縮を抑制することができる三次元光造形用のパターニング材料を提供する。三次元光造形用のパターニング材料は、ジアリルフタレートプレポリマーと、光硬化性モノマーと、光重合開始剤と、を含み、かつ室温で液状である。パターニング材料は、面露光でのパターニングに適している。ジアリルフタレートプレポリマーおよび光硬化性モノマーの総量に占めるジアリルフタレートプレポリマーの割合は、例えば5~40質量%である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)