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1. WO2017033185 - NANOPOROUS METAL-BASED FILM SUPPORTED ON AEROGEL SUBSTRATE AND METHODS FOR THE PREPARATION THEREOF

Publication Number WO/2017/033185
Publication Date 02.03.2017
International Application No. PCT/IL2016/050915
International Filing Date 22.08.2016
IPC
C04B 35/624 2006.01
CCHEMISTRY; METALLURGY
04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
BLIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
35Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
624Sol-gel processing
B01J 13/00 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
13Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
C01B 33/14 2006.01
CCHEMISTRY; METALLURGY
01INORGANIC CHEMISTRY
BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF
33Silicon; Compounds thereof
113Silicon oxides; Hydrates thereof
12Silica; Hydrates thereof, e.g. lepidoic silicic acid
14Colloidal silica, e.g. dispersions, gels, sols
C23C 14/02 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
02Pretreatment of the material to be coated
C23C 14/08 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
08Oxides
C23C 14/18 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
14Metallic material, boron or silicon
18on other inorganic substrates
CPC
B01J 13/0091
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
13Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
0091Preparation of aerogels, e.g. xerogels
B32B 15/04
BPERFORMING OPERATIONS; TRANSPORTING
32LAYERED PRODUCTS
BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
15Layered products comprising ; a layer of; metal
04comprising metal as the main or only constituent of a layer, ; which is next to another layer of the same or of a different material
B81C 1/0038
BPERFORMING OPERATIONS; TRANSPORTING
81MICROSTRUCTURAL TECHNOLOGY
CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
1Manufacture or treatment of devices or systems in or on a substrate
00349Creating layers of material on a substrate
0038Processes for creating layers of materials not provided for in groups B81C1/00357 - B81C1/00373
B82B 1/005
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
BNANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
1Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
005Constitution or structural means for improving the physical properties of a device
B82B 3/008
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
BNANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
3Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
008Processes for improving the physical properties of a device
C01B 33/1585
CCHEMISTRY; METALLURGY
01INORGANIC CHEMISTRY
BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; ; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
33Silicon; Compounds thereof
113Silicon oxides; Hydrates thereof
12Silica; Hydrates thereof, e.g. lepidoic silicic acid
14Colloidal silica, e.g. dispersions, gels, sols
157After-treatment of gels
158Purification; Drying; Dehydrating
1585Dehydration into aerogels
Applicants
  • BAR-ILAN UNIVERSITY [IL]/[IL]
Inventors
  • SALOMON, Adi
  • RON, Racheli
Agents
  • WEBB, Cynthia
  • WEBB, Cynthia
  • FISHER, Michal
  • BARZAM, Maty
  • BOGIN, Liora
  • BURSTEIN, Tal
  • FINAROV, Igal
  • FRIEDMAN, Nathalie
  • GANOR, Sharon
  • HORNIK, Vered
  • MILLER, Keren
  • NOAH, Eran
  • RECHAV, Betsalel
  • SCHICKLER, Hedva
  • SCHVARTZ, Iris
  • SILVERMAN, Eran
  • TRAVITSKY, Nina
  • WEBB, Yael
  • ZIPOR, Gadi
Priority Data
62/208,84624.08.2015US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) NANOPOROUS METAL-BASED FILM SUPPORTED ON AEROGEL SUBSTRATE AND METHODS FOR THE PREPARATION THEREOF
(FR) FILM À BASE DE MÉTAL NANOPOREUX SOUTENU PAR UN SUBSTRAT D'AÉROGEL ET PROCÉDÉS DE PRÉPARATION ASSOCIÉS
Abstract
(EN)
A method for the fabrication of a nanoporous metal -based film, the method comprising the steps of providing a ceramic aerogel substrate having a nanoporous structure, wherein the substrate comprises a bulk portion and a surface portion and wherein the surface portion is chemically or physically modified; and depositing a metal or a metal oxide from a deposition source on the ceramic aerogel substrate by a physical vapor deposition (PVD) process, wherein the deposition is performed at a power of less than about 90W or at a current ranging from about 0.5 mA to about 100 mA. Further provided is a nanoporous metal -based film supported on a ceramic aerogel substrate having a nanoporous 10 structure, wherein the nanoporous structure of the aerogel defines the nanoporous structure of the metal-based film.
(FR)
L'invention concerne la fabrication d'un film à base de métal nanoporeux. Le procédé selon l'invention consiste à obtenir un substrat d'aérogel céramique doté d'une structure nanoporeuse, le substrat comprenant une partie en vrac et une partie de surface, la partie de surface étant modifée chimiquement ou physiquement ; et à déposer un métal ou un oxyde métallique à partir d'une source de dépôt sur le substrat d'aérogel céramique par procédé de dépôt physique en phase vapeur (PVD), le dépôt étant effectué à une puissance inférieure à environ 90W ou à un courant compris entre environ 0,5 mA et environ 100 mA. L'invention concerne en outre un film à base de métal nanoporeux soutenu par un substrat d'aérogel céramique doté d'une structure nanoporeuse 10, la structure nanoporeuse de l'aérogel définissant la structure nanoporeuse du film à base de métal.
Also published as
Latest bibliographic data on file with the International Bureau