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1. (WO2017032801) DEVICE FOR APPLYING A LIQUID MEDIUM WHICH IS EXPOSED TO UV RADIATION TO A SUBSTRATE

Pub. No.:    WO/2017/032801    International Application No.:    PCT/EP2016/069979
Publication Date: Fri Mar 03 00:59:59 CET 2017 International Filing Date: Thu Aug 25 01:59:59 CEST 2016
IPC: B08B 3/10
B08B 7/00
C23C 16/455
H01L 21/67
Applicants: SÜSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO.KG
Inventors: DRESS, Peter
DIETZE, Uwe
GRABITZ, Peter
Title: DEVICE FOR APPLYING A LIQUID MEDIUM WHICH IS EXPOSED TO UV RADIATION TO A SUBSTRATE
Abstract:
The invention relates to a device for applying a liquid medium which is exposed to UV radiation to a substrate, said device comprising: a housing, having an elongated chamber, at least one inlet opening that opens towards the chamber, and a slot-type outlet opening opposite the at least one inlet opening and extending over the length of the chamber; and a tubular element extending in the longitudinal direction through the chamber and being at least partly transparent to UV radiation. The tubular element is arranged in the chamber such that a flow space is defined between the tubular element and the wall of the chamber, said flow space being symmetrical with respect to a longitudinal center plane of the chamber intersecting the outlet opening centrally. The tubular element extends into the slot-type outlet opening in the housing, forming two exit slots between the tubular element and the housing that extend in the longitudinal direction. The device further comprises at least one UV radiation source in the tubular element which is arranged to emit UV radiation from the housing in the direction of the flow space and through the outlet opening. The device is characterized by comprising means which cause UV radiation of a first wavelength range to be emitted through a first portion of the tubular element into the flow space. UV radiation of a second wavelength range is emitted through a second portion of the tubular element through the exit opening of the housing and optionally into an end portion of the flow space adjacent to the exit slots. The first and second wavelength ranges are different from each other and for at least one of the portions a maximum of 20%, preferably a maximum of 5% of the radiation output emitted through the respective portion comes from the other wavelength range.