Search International and National Patent Collections

1. (WO2017032569) SUPPRESSION FILTER, RADIATION COLLECTOR AND RADIATION SOURCE FOR A LITHOGRAPHIC APPARATUS; METHOD OF DETERMINING A SEPARATION DISTANCE BETWEEN AT LEAST TWO REFLECTIVE SURFACE LEVELS OF A SUPPRESSION FILTER

Pub. No.:    WO/2017/032569    International Application No.:    PCT/EP2016/068445
Publication Date: Fri Mar 03 00:59:59 CET 2017 International Filing Date: Wed Aug 03 01:59:59 CEST 2016
IPC: G03F 7/20
G02B 5/20
G02B 5/28
G02B 5/18
G02B 27/42
Applicants: ASML NETHERLANDS B.V.
Inventors: BANINE, Vadim, Yevgenyevich
NIENHUYS, Han-Kwang
SCACCABAROZZI, Luigi
Title: SUPPRESSION FILTER, RADIATION COLLECTOR AND RADIATION SOURCE FOR A LITHOGRAPHIC APPARATUS; METHOD OF DETERMINING A SEPARATION DISTANCE BETWEEN AT LEAST TWO REFLECTIVE SURFACE LEVELS OF A SUPPRESSION FILTER
Abstract:
Disclosed is a suppression filter having a profile defining at least two reflective surface levels, each reflected surface level being separated by a separation distance. The separation distance is such that the reflective suppression filter is operable to substantially prevent specular reflection of radiation at a first wavelength and at a second wavelength incident on said reflective suppression filter. Also disclosed is a radiation collector, radiation source and lithographic apparatus comprising such a suppression filter, and to a method of determining a separation distance between at least two reflective surface levels of a suppression filter.