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1. (WO2017032525) LITHOGRAPHIC METHOD AND APPARATUS

Pub. No.:    WO/2017/032525    International Application No.:    PCT/EP2016/067615
Publication Date: Fri Mar 03 00:59:59 CET 2017 International Filing Date: Tue Jul 26 01:59:59 CEST 2016
IPC: G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: VOOGD, Robbert Jan
ROOIJAKKERS, Wilhelmus, Jacobus, Maria
Title: LITHOGRAPHIC METHOD AND APPARATUS
Abstract:
An illumination system (IL) for a lithographic apparatus comprising a polarization adjustment apparatus (15) arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the polarization orientation by different amounts, a directing apparatus (6) operable to direct the radiation through one or more regions of the polarization adjustment apparatus, a controller (CN) configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions radiation is directed through to one or more regions which rotate the orientation of the linear polarization by substantially the same amount, and a diffuser configured to receive radiation output from the polarization adjustment apparatus and increase a range of angles at which the radiation propagates whilst substantially conserving the polarization state of the radiation.